2013 International Symposium onVLSI Design, Automation, and Test (VLSI-DAT) 2013
DOI: 10.1109/vldi-dat.2013.6533828
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Improving and optimizing reliability in future technologies with high-κ dielectrics

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Cited by 6 publications
(2 citation statements)
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“…2. This type of circuit timing error has been discussed by others as it is observable via conventional RO type measurements [12], [16], [17]. Additionally, many circuit design studies have presented possible design solutions to address this type of timing error [26]- [28].…”
Section: Eye Diagram and Jittermentioning
confidence: 99%
“…2. This type of circuit timing error has been discussed by others as it is observable via conventional RO type measurements [12], [16], [17]. Additionally, many circuit design studies have presented possible design solutions to address this type of timing error [26]- [28].…”
Section: Eye Diagram and Jittermentioning
confidence: 99%
“…Using the observed voltage and thickness dependence, Fig. 1 shows the voltage reduction requirement for interfacial layer (IL) scaling [4]. The 2013 ITRS roadmap anticipates sufficient voltage reduction to contain the expected impact on nFet T inv scaling, but NBTI will limit pFet scaling unless new materials such SiGe channel devices are adopted [5].…”
Section: Voltage and Tinv Scalingmentioning
confidence: 99%