2009
DOI: 10.1088/0268-1242/24/3/035011
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In-place bonding of GaAs/InGaAs/GaAs heterostructures to GaAs (0 0 1)

Abstract: Elastically strain-relaxed GaAs/In 0.08 Ga 0.92 As/GaAs heterostructures on GaAs (0 0 1) substrates were fabricated by the in-place bonding method. Pseudomorphic heterostructures were patterned and an underlying sacrificial AlAs layer was removed by selective etching. As the GaAs/InGaAs/GaAs structure is released from the substrate, elastic strain relaxation occurs in agreement with a force-balance model and the strain-relaxed structures are weakly bonded in place to the substrate. The bond between the strain-… Show more

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Cited by 10 publications
(20 citation statements)
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“…Similar measurements can also be transferred to widely used InGaAs QDs for tuning the HH-LH mixing over a broad range. This could be achieved, for example, by integrating them into a MBE-grown pre-stressed membrane [26,37]. If layers of the membrane are properly engineered then they could provide an additional tensile stress to the QDs, which would bring HH and LH states closer to each other, thus enhancing the HH-LH coupling.…”
Section: Hh-lh Mixing and Hh-lh Splitting In Qdsmentioning
confidence: 99%
“…Similar measurements can also be transferred to widely used InGaAs QDs for tuning the HH-LH mixing over a broad range. This could be achieved, for example, by integrating them into a MBE-grown pre-stressed membrane [26,37]. If layers of the membrane are properly engineered then they could provide an additional tensile stress to the QDs, which would bring HH and LH states closer to each other, thus enhancing the HH-LH coupling.…”
Section: Hh-lh Mixing and Hh-lh Splitting In Qdsmentioning
confidence: 99%
“…Other approaches to provide elastically-relaxed (defectfree) 'virtual substrates' include epitaxial growth on freestanding semiconductor slabs [8,9] and epitaxial growth of strained layers on a sacrificial layer that is later removed to allow elastic strain relaxation to occur [10,11]. One such approach, called in-place bonding, was first applied to achieve a strained Si layer on a Si(0 0 1) substrate [11] and more recently was demonstrated for GaAs/InGaAs/GaAs structures on GaAs(0 0 1) substrates [12,13]. In the latter case elastic strain relaxation and bonding occur during removal of a sacrificial AlAs or AlGaAs layer in a wet etch solution.…”
Section: Introductionmentioning
confidence: 99%
“…1b). Finally, to allow the light hole to become the ground state, a biaxial tensile strain of about 0.36% is induced on the ∼8-nmhigh quantum dots by embedding them into symmetrically prestressed membranes, which are then released from the substrate 24 (see arrows in Fig. 1a biaxial strain is achieved by placing the membranes onto a piezoelectric actuator 25,26 .…”
mentioning
confidence: 99%