A bottom-up approach was the key to the successful fabrication of this memory. This approach both minimized the number of processing steps following deposition of the molecular monolayer, as well as protected the molecules from remaining processing steps. In the following paragraphs, we briefly describe the nanofabrication procedures utilized to construct the memory circuit. A full paper describing these procedures in more detail will be submitted for publication in the near future. form an array of top Ti NW electrodes, and the crossbar structure is complete.