2019
DOI: 10.7567/1882-0786/ab0147
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InAlN underlayer for near ultraviolet InGaN based light emitting diodes

Abstract: We report on InAlN underlayer (UL) to improve the efficiency of near ultraviolet (NUV) light emitting diodes (LEDs). While InGaN UL is commonly used in high-efficiency blue LEDs it may absorb light for shorter wavelengths. InAlN lattice-matched to GaN exhibits a bandgap of 4.6 eV. This allows alleviating absorption issues in NUV LEDs. We demonstrate that the internal quantum efficiency of 405 nm single InGaN/GaN quantum well LEDs with InAlN UL is ∼70% compared to less than 10% for LEDs without UL. Excellent I–… Show more

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Cited by 35 publications
(45 citation statements)
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“…36 Furthermore, Haller et al observe no additional reduction of the nonradiative recombination for AlInN layer thicknesses above 50 nm. 34,35 In contrast, in the present work, a reduction of the nonradiative recombination is observed when the AlInN layer thickness is changed by several hundreds of nanometers, which goes along with a significant reduction of the strain in the QW structure. Although a possible effect of indium in the buffer layer on the nonradiative recombination cannot be excluded, it does not seem to be dominating in the present study.…”
contrasting
confidence: 79%
See 1 more Smart Citation
“…36 Furthermore, Haller et al observe no additional reduction of the nonradiative recombination for AlInN layer thicknesses above 50 nm. 34,35 In contrast, in the present work, a reduction of the nonradiative recombination is observed when the AlInN layer thickness is changed by several hundreds of nanometers, which goes along with a significant reduction of the strain in the QW structure. Although a possible effect of indium in the buffer layer on the nonradiative recombination cannot be excluded, it does not seem to be dominating in the present study.…”
contrasting
confidence: 79%
“…One might suspect that indium in AlInN itself is involved in the process of reducing defects in the QWs, as recently reported by Haller et al [33][34][35] for c-plane QWs, where a reduction in the nonradiative recombination is observed when an indium-containing underlayer grown at low temperatures is inserted before the QW structure. As mentioned in the beginning, all the samples investigated here include a similar low-temperature GaN underlayer of about 20 nm thickness.…”
mentioning
confidence: 82%
“…A lattice-matched In 0.17 Al 0.83 N/GaN superlattice (SL) was chosen as an underlayer to bury surface defects. 21,27 Five samples with varying underlayer thickness were grown by changing the number of SL periods, n-these samples are then labelled as Pn (Fig. 1a).…”
Section: Resultsmentioning
confidence: 99%
“…This result agreed well with the PL measurement results. The reason was that native defects such as V N were trapped by the indium atom in the pre-strained well to form the In-V N with lower energy [ 31 , 32 , 33 ]; therefore, reducing the number of defects in the subsequently grown quantum well layer. Thus, the FWHM of the PL spectrum was reduced and the non-radiative recombination lifetime was increased.…”
Section: Resultsmentioning
confidence: 99%