2019
DOI: 10.1016/j.tsf.2019.05.027
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Influence of ion beam parameters onto two-dimensional optical thin film thickness distributions deposited by ion beam sputtering

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Cited by 7 publications
(1 citation statement)
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“…The measured thickness of Au@GF/PVDF pressed by 0 MPa, 2 MPa, 4 MPa, and 6 MPa are 55 ± 5, 40 ± 3, 35 ± 3, and 33 ± 3 µm, respectively. Because of the excessively low content of Au NPs that cannot be measured, the content of Au NPs can be roughly calculated based on formulas of sputtered layer thickness (D) and mass (M) [22]:…”
Section: Preparation Of Au@gf/pvdf 0-3-3 Composites and Pure Pvdf Filmsmentioning
confidence: 99%
“…The measured thickness of Au@GF/PVDF pressed by 0 MPa, 2 MPa, 4 MPa, and 6 MPa are 55 ± 5, 40 ± 3, 35 ± 3, and 33 ± 3 µm, respectively. Because of the excessively low content of Au NPs that cannot be measured, the content of Au NPs can be roughly calculated based on formulas of sputtered layer thickness (D) and mass (M) [22]:…”
Section: Preparation Of Au@gf/pvdf 0-3-3 Composites and Pure Pvdf Filmsmentioning
confidence: 99%