1993
DOI: 10.1016/0257-8972(93)90101-s
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Influence of plasma surface treatment on the adhesion of thin films on metals

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Cited by 12 publications
(2 citation statements)
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“…With increasing power from 10 to 80 W, the intensity of the band at 1080 cm -1 (Si-O-Si) growths with respect to that at 1030 cm -1 , indicating variations in the SiO x stoichiometry, with x approaching two 23 . There is a rise of news bands lying at 1354 cm -1 (-CH 2 scissors in Si(CH 2 )Si 24,25 ) and 890 cm -1 (-CH 3 rotation in Si(CH 3 ) 2 ) 10 , indicating further fragmentation of the starting organosilicon monomer with increasing P. Furthermore, bands at 3645 cm -1 (OH stretching) assigned to silanol groups 19 develop in the spectra as P is elevated.…”
Section: Wavenumber (Cm -1 ) Modementioning
confidence: 93%
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“…With increasing power from 10 to 80 W, the intensity of the band at 1080 cm -1 (Si-O-Si) growths with respect to that at 1030 cm -1 , indicating variations in the SiO x stoichiometry, with x approaching two 23 . There is a rise of news bands lying at 1354 cm -1 (-CH 2 scissors in Si(CH 2 )Si 24,25 ) and 890 cm -1 (-CH 3 rotation in Si(CH 3 ) 2 ) 10 , indicating further fragmentation of the starting organosilicon monomer with increasing P. Furthermore, bands at 3645 cm -1 (OH stretching) assigned to silanol groups 19 develop in the spectra as P is elevated.…”
Section: Wavenumber (Cm -1 ) Modementioning
confidence: 93%
“…Figure 3 shows the infrared spectra of films deposited using two different oxygen proportions in the plasma feed: 0 and 50%. The wavenumber of the main absorption bands were collected and identified in Table 1, according to other relevant studies 10,11,[19][20][21][22][23][24][25] . The spectra revealed the presence of asymmetric (2950 cm -1 ) and symmetric (2900 cm -1 ) C-H stretching vibrations.…”
Section: Thicknessmentioning
confidence: 99%