1995
DOI: 10.1016/0921-5107(94)01121-4
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Influence of rapid thermal annealing on the properties of SnO2 thin films

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Cited by 5 publications
(2 citation statements)
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“…Many studies on the effect of annealing temperature on film characteristics have been reported (Beshkov et al 1993;Wang et al 2006). Generally with an increase in annealing temperature, structure of the film changes from amorphous to crystalline and grain growth occurs with increase in mobility with temperature.…”
Section: Structural Properties Of Filmsmentioning
confidence: 97%
“…Many studies on the effect of annealing temperature on film characteristics have been reported (Beshkov et al 1993;Wang et al 2006). Generally with an increase in annealing temperature, structure of the film changes from amorphous to crystalline and grain growth occurs with increase in mobility with temperature.…”
Section: Structural Properties Of Filmsmentioning
confidence: 97%
“…Also, incorporating the combustion chemistry in plasma-induced processes reduces the oxide formation time, but the device compatibility is yet unclear . In recent times, rapid thermal annealing (RTA) has also been reported for metal oxide layer formation, which significantly reduces the device processing time, but, due to the nature of the thermal cycling process, the applicability is, therefore, substrate-limited. In a similar route, photonically cured , (i.e., pulsed Xe) and also near-infrared-induced (either continuous or time-modulated) heating has also been demonstrated , to develop the perovskite layer only, which is, however, the least of concern due to its low formation energy.…”
Section: Introductionmentioning
confidence: 99%