1998
DOI: 10.1016/s0022-0248(98)00712-x
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InGaP/GaAs hole barrier asymmetry determined by (002) X-ray reflections and p-type DB-RTD hole transport

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Cited by 10 publications
(11 citation statements)
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“…In the literature basically two compounds have been proposed to be the interlayer alloy, i.e., In x Ga 1−x As [8,14,18,19] and In x Ga 1−x As 1−y P y [7,8,10,13,20,21]. The formation of either one of these two compounds has been reported to be strongly affected by the growth conditions, such as growth interruption or not, duration of the PH 3 purge after stopping the growth of InGaP, duration of the As H 3 pre-flow before TMGa is introduced, intentional interposition of some extra layer etc [7,8,10,13,14,[18][19][20][21].…”
Section: Resultsmentioning
confidence: 99%
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“…In the literature basically two compounds have been proposed to be the interlayer alloy, i.e., In x Ga 1−x As [8,14,18,19] and In x Ga 1−x As 1−y P y [7,8,10,13,20,21]. The formation of either one of these two compounds has been reported to be strongly affected by the growth conditions, such as growth interruption or not, duration of the PH 3 purge after stopping the growth of InGaP, duration of the As H 3 pre-flow before TMGa is introduced, intentional interposition of some extra layer etc [7,8,10,13,14,[18][19][20][21].…”
Section: Resultsmentioning
confidence: 99%
“…InGaP/GaAs has a low conduction band offset that makes it very suitable for HBTs [9]. However, the InGaP/GaAs system has the drawback that an extra interlayer spontaneously forms at the GaAs-on-InGaP interface (inverted interface) [7][8][9][10][12][13][14][15][16][17][18][19][20][21]. The causes suggested in the literature for its formation are three: In carry-over, As/P exchange and P/As intermixing at the location of the inverted interface [7][8][9][10][12][13][14][15][16][17][18][19][20][21].…”
Section: Introductionmentioning
confidence: 99%
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