2008
DOI: 10.1143/apex.2.015501
|View full text |Cite
|
Sign up to set email alerts
|

Inverted Aluminum-Induced Layer Exchange Method for Thin Film Polycrystalline Silicon Solar Cells on Insulating Substrates

Abstract: In order to achieve high efficiency thin film polycrystalline silicon (poly-Si) solar cells on insulating substrate, we have developed a novel crystallization method of amorphous silicon (a-Si), an inverted aluminum-induced layer exchange (inverted-ALILE) method, where a metallic aluminum layer remains between the crystallized p þ -layer and a glass substrate to function a back contact in contrast to the conventional ALILE method. Crystallization process of a-Si during inverted-ALILE was observed in-situ by op… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
26
0

Year Published

2009
2009
2015
2015

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 25 publications
(26 citation statements)
references
References 11 publications
0
26
0
Order By: Relevance
“…The initial a-Si layer can be exposed to air to form a Si-oxide, [17][18][19] or a thin Al layer can be evaporated on the a-Si, which is oxidized to form an Al-oxide. 15 For both configurations a complete layer exchange is observed.…”
Section: Introductionmentioning
confidence: 91%
See 1 more Smart Citation
“…The initial a-Si layer can be exposed to air to form a Si-oxide, [17][18][19] or a thin Al layer can be evaporated on the a-Si, which is oxidized to form an Al-oxide. 15 For both configurations a complete layer exchange is observed.…”
Section: Introductionmentioning
confidence: 91%
“…This leads to a reduction in the series resistance and therefore to higher solar cell efficiencies. 15,16 While for the ALILE process the interlayer is commonly an Al-oxide, in the R-ALILE process two different alternatives are used. The initial a-Si layer can be exposed to air to form a Si-oxide, [17][18][19] or a thin Al layer can be evaporated on the a-Si, which is oxidized to form an Al-oxide.…”
Section: Introductionmentioning
confidence: 99%
“…This method enables us to fabricate seed layers for epitaxially grown absorbers for thin-film solar cells on inexpensive SiO 2 substrates [2][3][4][5][6][7]. Conventional solid phase crystallization (SPC) requires temperatures higher than 600 1C, and the Si grains obtained are as small as a few mm [8].…”
Section: Introductionmentioning
confidence: 99%
“…This is favorable for the subsequent growth of BaSi 2 layers, because a-axis-oriented BaSi 2 films can be epitaxially grown on Si(111) with a lattice mismatch of approximately 1% [11][12][13][14][15]. However, the growth of (1 0 0)-oriented Si layers has been also reported [16][17][18].…”
Section: Introductionmentioning
confidence: 99%