Investigation of microstructure, micro-mechanical and optical properties of HfTiO 4 thin films prepared by magnetron co-sputtering

Mazur, М.; Wojcieszak, Damian; Domaradzki, J.; Kaczmarek, Danuta; Poniedziałek, Agata; Domanowski, P.

doi:10.1016/j.materresbull.2015.07.011

Cited by 18 publications

(13 citation statements)

References 38 publications

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“…It was also found that the TiO 2 -rutile thin films were textured among (110) crystal plane. Small shifts between the diffraction peaks of deposited coatings and standard values from PDF cards [26,27] could indicate negligible stresses that might occur in the microstructure [28][29][30]. It was found that thin films with the anatase phase had crystallites of ca.…”

Section: Microstructurementioning

confidence: 99%

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

et al. 2018

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In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films.

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Section: Microstructurementioning

confidence: 99%

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

et al. 2018

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“…Transparent thin films based on titanium dioxide (TiO 2 ) and hafnium dioxide (HfO 2 ) are widely used in industrial applications such as optical and protective coatings or optoelectronic devices. HfO 2 and TiO 2 are characterized by many advantages, e.g., very good thermal, chemical, and mechanical stability and high transparency [1][2][3][4][5]. Both are also known as hard oxides with high wear and scratch resistance to mechanical damage.…”

Section: Introductionmentioning

confidence: 99%

“…Due to a high transmittance over a wide spectral range from the ultraviolet (200 nm) to near-infrared (1.2 µm), low optical absorption and dispersion [6][7][8], high reactive index (about 1.85-2.15) [2,9], wide band gap energy (E g = 5.8 eV) [1,10] and hydrophobic properties [2,9], hafnium dioxide is one of the most commonly used materials in optical applications [11,12]. Depending on the conditions, hafnium oxide can exist in one of the three polymorphous forms.…”

Section: Introductionmentioning

confidence: 99%

“…Titanium dioxide is one of the basic "high index" materials, which can be used in the construction of optical coatings, for example [16]. Due to its high refractive index (2.2-2.6), high dielectric constant, optical transmittance in the visible range and photocatalytic activity, TiO 2 is used in various fields of industry [1]. TiO 2 thin films can be used in antireflective and protective coatings, self-cleaning and gas sensing films.…”

Section: Introductionmentioning

confidence: 99%

“…Therefore, such mixtures can combine the advantages of HfO 2 and TiO 2 . These thin films can also exhibit high hardness and very good optical parameters, e.g., a low extinction coefficient [1]. Due to these qualities, mixed HfO 2 -TiO 2 thin films can be used as functional optical coatings.…”

Section: Introductionmentioning

confidence: 99%

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Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

et al. 2016

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Abstract:In this paper the influence of material composition on the structural, surface and optical properties of HfO 2 -TiO 2 mixed oxide coatings was investigated and discussed. Five sets of thin films were deposited using reactive magnetron sputtering: HfO 2 , TiO 2 and three sets of mixed HfO 2 -TiO 2 coatings with various titanium content. The change in the material composition had a significant influence on the structural, surface and optical properties. All of the deposited coatings, except for (Hf 0.55 Ti 0.45 )O x , were nanocrystalline with crystallites ranging from 6.7 nm to 10.8 nm in size. Scanning electron microscopy measurements revealed that surface of nanocrystalline thin films consisted of grains with different shapes and sizes. Based on optical transmission measurements, it was shown that thin films with higher titanium content were characterized by a higher cut-off wavelength, refractive index and lower optical band gap energy. The porosity and packing density were also determined.

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The effect of post-process annealing on optical and electrical properties of mixed HfO2–TiO2 thin film coatings

Obstarczyk

Kaczmarek

Mazur

et al. 2019

J Mater Sci: Mater Electron

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In this paper a comparison of electrical and optical properties of mixed hafnium-titanium oxides is described. Thin films were deposited with the use of the magnetron co-sputtering method. For further analysis (Hf 0.52 Ti 0.48)Ox and (Hf 0.29 Ti 0.71) Ox coatings, which were amorphous directly after the deposition process, were chosen,. Moreover, post-process annealing was also performed in order to compare the electrical and optical properties of amorphous and nanocrystalline thin films with the same material composition. It was found that the phase transition from amorphous to orthorhombic HfTiO 4 occurred in the case of (Hf 0.52 Ti 0.48)Ox coating at 650 °C. In turn, the phase transition to TiO 2-anatase was observed at the temperature of 600 °C in the case of (Hf 0.29 Ti 0.71)Ox thin film. The leakage current for both amorphous coatings was in the range of 10 −7-10 −8 A/cm 2. After additional annealing and phase transition, the leakage current slightly decreased for (Hf 0.29 Ti 0.71)Ox thin film, while in the case of (Hf 0.52 Ti 0.48)Ox sample the resistance switching effect was observed. The dielectric constant was equal to 24 and 25 for amorphous (Hf 0.52 Ti 0.48)Ox and (Hf 0.29 Ti 0.71)Ox films, respectively. However, after the phase transition it decreased to 15 for (Hf 0.52 Ti 0.48)Ox and increased to 51 for (Hf 0.29 Ti 0.71)Ox film. The results of optical studies showed that amorphous thin films were well transparent in a visible light range with an average transparency of ca. 85%. After the phase transition to HfTiO 4-orthorhombic and TiO 2-anatase, a slight decrease in the transparency level by 3% and a redshift of the cutoff wavelength was observed. Moreover, additional annealing caused small changes of the optical band gap energy, refractive index and extinction coefficient.

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Investigation of microstructure, micro-mechanical and optical properties of HfTiO 4 thin films prepared by magnetron co-sputtering

Cited by 18 publications

References 38 publications

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

The effect of post-process annealing on optical and electrical properties of mixed HfO2–TiO2 thin film coatings

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