2016
DOI: 10.1134/s1063780x16030016
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Investigation of the helicon discharge plasma parameters in a hybrid RF plasma system

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Cited by 7 publications
(9 citation statements)
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“…The achieved plasma concentrations near the substrate correspond to those required in this work. Detailed studies of the physical causes for the axial redistribution of plasma density as the magnetic field induction increases have shown that the effect is associated with the patterns of excitation of partial standing waves in the plasma [17,27]. It should be noted that the use of other configurations of the magnetic field did not result in significant increase in the ionic saturation current near the substrate.…”
Section: Basic Physical Patterns Underlying the Design Of A Plasma Rementioning
confidence: 98%
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“…The achieved plasma concentrations near the substrate correspond to those required in this work. Detailed studies of the physical causes for the axial redistribution of plasma density as the magnetic field induction increases have shown that the effect is associated with the patterns of excitation of partial standing waves in the plasma [17,27]. It should be noted that the use of other configurations of the magnetic field did not result in significant increase in the ionic saturation current near the substrate.…”
Section: Basic Physical Patterns Underlying the Design Of A Plasma Rementioning
confidence: 98%
“…In [14], the possibility of generating plasma flows with the ion component density of up to 20-30 mA/cm 2 and independently controlled ion energy within the range of 20-120 eV by using a combination of arc discharge with inductive radiofrequency (RF) discharge in external magnetic field is shown. The results obtained in [14] served as the starting point for the development of a plasma reactor [15][16][17][18], intended for the magnetron sputtering of functional coatings using stimulation by ions, generated in RF inductive discharge with external magnetic field.…”
Section: Introductionmentioning
confidence: 99%
“…Helicon source, in contrast to the conventional one, in which only power can be adjusted, provides additional capabilities to control the composition and structure of the plasma, namely the size and configuration of external magnetic fields. Regulation of these parameters allows control of plasma density and its spatial distribution in the area of the substrate holder [1][2][3].…”
Section: #8 / 70 / 2016mentioning
confidence: 99%
“…При использовании геликонного разряда, в отли-чие от обычного, в котором варьируется только мощность, существуют дополнительные инстру-менты для управления составом и структурой плазмы, а именно величина и конфигурация внешних магнитных полей. Регулирование ука-занных параметров позволяет управлять плотно-стью плазмы и ее пространственным распределе-нием в области подложкодержателя [1][2][3].И ннов а ц ионна я ус та новк а "Ге ли кон-ТМ" спроек тирована для проведения исследований и разработки широкого класса новых управляе-мых технологических процессов нанесения функ-циональных покрытий различных материалов методами магнетронного распыления и / или электродугового испарения в плазме геликон-ного разряда. Плазмостимулированные процессы осаждения с регулируемой плотностью и энергией плазменного воздействия обеспечивают управ-ляемое наноструктурирование покрытий, которые могут использоваться в различных областях науки и техники (нано-, микро-, опто-, фото-и радиоэлек-троника, медицина, накопители энергии и др.).…”
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