A laser with an active volume consisting of only a single quantum wire in the 1-dimensional (1-D) ground state is demonstrated. The single wire is formed quantum-mechanically at the T-intersection of a 14 nm Al0.07Ga0.93As quantum well and a 6 nm GaAs quantum well, and is embedded in a 1-D single-mode optical waveguide. We observe single-mode lasing from the quantum wire ground state by optical pumping. The laser operates from 5 to 60 K, and has a low threshold pumping power of 5 mW at 5 K. PACS numbers: (78.67.Lt, 78.45.+h, 73.21.Hb, 42.55.Px.) A quantum wire laser is a novel semiconductor laser based on a 1-dimensional (1-D) active region such that the electron and hole carriers are allowed to move only in that one direction. In contrast, more familiar semiconductor lasers are 3-D double-hetero-structure lasers and 2-D quantum well lasers. Because the 1-D density of states (DOS) becomes more enhanced at the bottom of its band edge than the 2-D or 3-D DOS, a quantum wire laser is expected to show improvement in lasing performance [1, 2, 3, 4].However, fabrication of a single quantum wire that lases from the lowest quantum state of the wire is difficult. Indeed all quantum wire lasers so far reported are either multiple-wire lasers [5,6,7,8,9,10], which have many quantum wires in the active region, or they are wide single-wire lasers which lase only in their excitedsubband states [11,12,13]. The excited-state lasing is typically characterized by a lasing energy above the energy of ground-state spontaneous emission at low pump levels. Since excited subbands allow motion of carriers in directions perpendicular to the axis of the wire, such excited-state wire lasing is not expected to have 1-D characteristics.In this paper, we demonstrate a single quantum wire laser with only one 1-D subband, and observe stable single-mode lasing from this ground state subband of our quantum wire.The single quantum wire laser is fabricated by an advanced crystal growth method called cleaved-edge overgrowth with molecular beam epitaxy (MBE) [14], in which two MBE growth steps are separated by an in situ wafer cleave. In the first MBE growth, we successively grew at 600 o C on a non-doped (001) GaAs substrate, a 500 nm GaAs buffer layer, a 1.5 µm Al 0.5 Ga 0.5 As a) Electronic mail: haya@issp.u-tokyo.ac.jp cladding layer, a 250 nm Al 0.35 Ga 0.65 As barrier, a 14 nm Al 0.07 Ga 0.93 As quantum well (stem well), a 250 nm Al 0.35 Ga 0.65 As barrier, 1.5 µm Al 0.5 Ga 0.5 As cladding layer, and a 6.5 µm GaAs cap layer. Then, we cleaved the wafer in the MBE chamber, and grew at 490 o C on the newly exposed (110) edge, a 6 nm GaAs quantum well (arm well), a 10 nm Al 0.5 Ga 0.5 As barrier, a 111 nm Al 0.1 Ga 0.1 As core layer, a 960 nm Al 0.5 Ga 0.5 As cladding layer, and a 10 nm GaAs cap layer. After the growth of the arm well, we interrupted growth and annealed the GaAs surface for 10 minutes at 600 o C [15]. Figure 1 shows a schematic cross-sectional view of the single quantum wire laser structure. At a T-shaped inter-