“…The rapid advancements of nanotechnology, however, has motivated researchers to fabricate epitaxial films on a semiconductor such as silicon with atomic-scale precision. This was accomplished by what is called two-step growth method [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18] utilizing a kinetic path to avoid a route to the thermodynamically stable states. Thus fabricated ultrathin metal films can possess Shockley surface states 3,6,17,18 and quantum well states 3,6,7,15,16 due to the electron confinement in the normal direction, both of which are well-defined two-dimensional (2D) systems.…”