2006 IEEE International Reliability Physics Symposium Proceedings 2006
DOI: 10.1109/relphy.2006.251230
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Lifetime Enhancement under High Frequency NBTI measured on Ring Oscillators

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Cited by 15 publications
(11 citation statements)
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“…Experimental results concerning AC NBTI degradation reflect a similar disagreement on the frequency dependence of AC NBTI degradation. Different papers show a clear frequency dependence of NBTI degradation [44,45,46,47,48,49]. It has also been claimed that only the formation of positive oxide charge contributes to any frequency dependency, while interface state generation is frequency independent [50].…”
Section: Ac Effectsmentioning
confidence: 99%
See 1 more Smart Citation
“…Experimental results concerning AC NBTI degradation reflect a similar disagreement on the frequency dependence of AC NBTI degradation. Different papers show a clear frequency dependence of NBTI degradation [44,45,46,47,48,49]. It has also been claimed that only the formation of positive oxide charge contributes to any frequency dependency, while interface state generation is frequency independent [50].…”
Section: Ac Effectsmentioning
confidence: 99%
“…The frequency range discussed in these papers generally does not exceed the MHz range. Only in [49,53] NBTI degradation under RF stress conditions is discussed. In [49] use is made of a ring oscillator circuit and device parameter degradation is monitored indirectly using degradation in the oscillation frequency.…”
Section: Ac Effectsmentioning
confidence: 99%
“…Once a node's performance has fallen below a predefined threshold, it has to go through the test & recovering phase in order to remove the impact of NBTI dominant stress from PMOS devices. Relaxation can be accomplished though AC load or the condition of V g = V DD [8], [12]. If after the test & recovering phase the performance degradation remains above a predefined threshold, the node is marked as broken.…”
Section: Proposed Architecturementioning
confidence: 99%
“…P ERFORMANCE degradation of logic CMOS circuits, such as ring oscillators (ROs), is typically linked to the degradation mechanism in discrete devices, namely, bias temperature instability (BTI) and hot-carrier injection (HCI) [1]- [7]. With the introduction of metal gate/high-k (MG/HK) technologies, both nFET and pFET devices exhibit positive bias temperature (PBTI) and negative bias temperature instability (NBTI), respectively, while for conventional poly-Si/SiON technologies, only pFETs degrade due to NBTI stress.…”
Section: Introductionmentioning
confidence: 99%