“…Recently, a remarkable efficiency of 23.5% was reached for silicon heterojunction solar cells using hole-collecting and transparent MoO x (4 nm) to replace a-Si:H(p) . Additionally, wide variety of electron selective contact materials, such as metals (e.g., Ca, Mg, , Sc, and Yb), metal oxides (e.g., MgO, TiO 2 , , ZnO, Ta 2 O x , BaO x , and Nb 2 O 5 ), metal nitrides (e.g., TaN x , TiN x ), fluoride salts (e.g., LiF x , and MgF 2 ), carbonates (e.g., CsCO 3 , K 2 C x O y , Rb 2 C x O y , CaC x O y , SrC x O y , and BaC x O y ), , and their stack combination, ,, have been successfully inserted between metal and n-Si to reduce the Schottky barrier and eliminate the Fermi level pinning effect at the Al/n-Si interface. Moreover, full dopant-free silicon solar cell technologies utilizing dopant-free hole and electron transport layers simultaneously have the potential to be a highly efficient and low-cost technique in the field of industrial silicon solar cells. , …”