“…The latter is demonstrated in Figure where representative examples of such patterns are presented. Consequently, e-beam lithography, which also has the advantages of a flexible form of the written features as well as dose variation across the pattern, can be a valuable alternative to other approaches to WF patterning such as microcontact printing. ,, Significantly, the dynamic range of the in situ variation of the WF covered by the PyPP1, TP1-up, and TP1-down SAMs is exceptionally large, viz. from +5.2 to +3.4 eV, with a small gap around +4.0 eV, between the minimal value for TP1-up/Au and the maximal value for TP1-down/Au (Figure a), which, however, can be covered by a proper mixed SAM of both these constituents .…”