1982
DOI: 10.1117/12.932797
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<title>New 6.5 µm Photodiodes For Schottky Barrier Array Applications</title>

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1983
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Cited by 6 publications
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“…The main precaution which must be taken with this technique is to assure that the implanted layer is of high enough concentration to cause barrier lowering, but is not so high as to cause the depletion layer to breakdown. The results reported in ( 12 ) showed that the effective barrier height is reduced from 270 mV to 220 mV corresponding to an extension of the photoresponse cut-off from 4.6un to 5.6vm.…”
Section: The Future Of Schottky Technologymentioning
confidence: 87%
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“…The main precaution which must be taken with this technique is to assure that the implanted layer is of high enough concentration to cause barrier lowering, but is not so high as to cause the depletion layer to breakdown. The results reported in ( 12 ) showed that the effective barrier height is reduced from 270 mV to 220 mV corresponding to an extension of the photoresponse cut-off from 4.6un to 5.6vm.…”
Section: The Future Of Schottky Technologymentioning
confidence: 87%
“…The results reported ín (12) showed that the effective barrier height is reduced from 270 mV to 220 mV corresponding to an extension of the photoresponse cut -off from 4.61n to 5.6 um.…”
Section: Recent Advances In Schottky Technologymentioning
confidence: 92%
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