Mechanical and Electrical Properties of Al2O3 Thin Films on Metals, Ceramics and Resins Prepared by Aerosol Deposition Method

Tsujimichi, Kazuya; Mori, Kohei; Yoshida, Akitoshi; Iwasawa, Junichi; Hatono, Hironori; Kiyohara, Masakatsu; Lebedev, Maxim; Akedo, Jun

doi:10.1002/9780470294826.ch18

Cited by 7 publications

(7 citation statements)

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“…[3][4][5] We confirmed that this method can deposit some oxides, composite oxides, and nitrides. Mechanical and electrical properties have been reported for an Al 2 O 3 film, 6 as well as electro-optical properties of (Pb, La) (Zr, Ti)O 3 film 7 and Y 2 O 3 films 8,9 produced using aerosol deposition.…”

Section: Introductionmentioning

confidence: 99%

Multilayer Construction with Various Ceramic Films for Electronic Devices Fabricated by Aerosol Deposition

Hatono¹,

Ito²,

Iwata³

et al. 2006

Int J Applied Ceramic Tech

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Aerosol deposition (AD) is applicable as a fabrication technology for microstructures comprising different materials. We used this method for electronic devices that consist of ceramic films and metal electrodes. Various ceramic thick films (5–50 μm thickness), for example, Al2O3, 2MgO·SiO2, and BaTiO3, were deposited on substrates using room‐temperature aerosol deposition. The dielectric constant of BaTiO3 was 78 at 1 MHz. Multilayer constructions with ceramic films and copper electrodes were obtained using aerosol deposition and sputtering. During deposition, photoresist film masks were applied to produce patterns of ceramic films and connections between upper and lower electrodes through the ceramic films.

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Section: Introductionmentioning

confidence: 99%

Multilayer Construction with Various Ceramic Films for Electronic Devices Fabricated by Aerosol Deposition

Hatono¹,

Ito²,

Iwata³

et al. 2006

Int J Applied Ceramic Tech

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“…The film prepared by aerosol deposition is known to have a high density without voids and excellent electrical and mechanical properties. The volume resistivity and the Vickers hardness of the Al 2 O 3 film prepared by aerosol deposition are 10 15 Ω·cm and 13.7 GPa, respectively, 7 and are essentially the same with those of Al 2 O 3 bulk.…”

Section: Introductionmentioning

confidence: 61%

Plasma‐Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process

Iwasawa

Nishimizu

Tokita

et al. 2007

Journal of the American Ceramic Society

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143

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Dense yttrium oxide film was prepared on a quartz substrate by the aerosol deposition process at the room temperature. The deposition rate was very high, 60 m/h. Thick film of 10 m was easily achievable on the quartz substrate. Transmission electron microscopy showed that the film was highly dense without voids and was composed of randomly oriented Y2O3 crystallites of sizes smaller than 20 nm. The interface between the film layer and the quartz substrate was homogeneous. The film (2‐m thick) had a high transmittance (55–85%) in the wavelength region of 250‐800 nm. The mechanical properties of the film were very good. The adhesion force of the interface between the Y2O3 layer and the quartz substrate was over 80 MPa. The Vickers hardness of the film was 7.7 GPa. The film also had an excellent plasma resistance in a gas mixture of CF4/O2. Outstanding results were noted in eroded depth, surface roughness, nanostructure, and transmittance change after plasma exposure of the film.

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“…The collided particles bond to each other, are deposited continuously on the substrate, and a dense layer with a nano-crystal structure is formed [17,19]. A variety of brittle materials such as titanium oxide, zinc oxide, iron oxide, zirconium oxide, yttrium oxide, silicon oxide, aluminium nitride, barium titanate, calcium titanate, and strontium titanate could be applied, but aluminium oxide was selected because of its transparency, superior hardness, biological safety, and reliability [19].…”

Section: Discussionmentioning

confidence: 99%

“…In the past decade, aerosol deposition has been employed to generate a ceramic coating [17][18][19]. Ceramic submicron particles were sprayed from a nozzle onto the target surface, and then the particles were collided.…”

Section: Introductionmentioning

confidence: 99%

Thickness and surface structure of a ceramic layer created on three indirect resin composites with aerosol deposition

Taira

Hatono

Tokita

et al. 2010

Journal of Prosthodontic Research

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Purpose: Aerosol deposition is a technology for coating ceramics with impact consolidation at room temperature. The aim of the present study was to investigate the thickness and the microstructure of the aluminium oxide layer on different three dental resin composite materials created by means of aerosol deposition.Methods: Disk-shaped specimens were fabricated with three resin composites (Estenia C&B, Targis, and Gradia). The specimens were ground flat, and then subjected to aerosol deposition using aluminium oxide submicron particles without inducing a localized temperature rise. The average thickness (AVH) and maximum thickness (Hmax) of the aluminium oxide layer deposited on the resin composite material were measured using a profilometer. Data were analyzed by ANOVA and post-hoc Tukey Compromise test at =0.05. The specimen surfaces were also observed using a scanning electron microscope. Results:The aluminium oxide layer formed on Estenia C&B (AVH 8.1 µm, Hmax 9.1 µm) and Targis (AVH 7.7 µm, Hmax 8.9 µm) were significantly thicker than that on Gradia (AVH 4.2 µm, Hmax 5.4). The micrograph showed that the aluminium oxide layer on Estenia C&Bwas similar to that on Targis. However, the aerosol deposition area of Gradia was seen relatively rough and partly caved. Conclusions:The type of resin composite affected the microstructure of the deposited aluminium oxide layer. The highly filled light-and heat-cured resin 3 composites are advantageous as a target material rather than lower the filled lightcured resin composite.4

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Mechanical and Electrical Properties of Al2O3 Thin Films on Metals, Ceramics and Resins Prepared by Aerosol Deposition Method

Cited by 7 publications

References 0 publications

Multilayer Construction with Various Ceramic Films for Electronic Devices Fabricated by Aerosol Deposition

Multilayer Construction with Various Ceramic Films for Electronic Devices Fabricated by Aerosol Deposition

Plasma‐Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process

Thickness and surface structure of a ceramic layer created on three indirect resin composites with aerosol deposition

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