“…Normally off, E-mode GaAs metal-semiconductor field-effect transistors ͑MES-FETs͒ and GaAs high-electron-mobility transistors ͑HEMTs͒ have been demonstrated by various research groups. [1][2][3][4] However, in GaAs MESFETs and HEMTs, the Schottky-contact gate formation suffers from high leakage current, which limits the input dynamic range, increases the noise figure, and prevents the large scale integration of these transistors. In order to restrain the gate leakage current, insulating layers were introduced between metal gates and compound semiconductors through different techniques such as in situ molecular beam expitaxy ͑MBE͒ Ga 2 O 3 ͑Gd 2 O 3 ͒ ͑Refs.…”