1999
DOI: 10.1016/s0924-4247(98)00268-4
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Micromachining by ion track lithography

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Cited by 20 publications
(5 citation statements)
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“…After a relatively low dose to define the pores for paraffin application, the samples could be subjected to a second more intensive irradiation through a stencil mask with openings corresponding to the contours of the device. This approach is called micromachining by ion track lithography [16]. With properly balanced exposures, a single etching step will give the right porosity and liberate the device from its sheet at the same time.…”
Section: Discussionmentioning
confidence: 99%
“…After a relatively low dose to define the pores for paraffin application, the samples could be subjected to a second more intensive irradiation through a stencil mask with openings corresponding to the contours of the device. This approach is called micromachining by ion track lithography [16]. With properly balanced exposures, a single etching step will give the right porosity and liberate the device from its sheet at the same time.…”
Section: Discussionmentioning
confidence: 99%
“…Ion track projection lithography has been demonstrated several times, e.g. [32,33], with a recent extension into nanolithography with pattern transfer into amorphous silicon dioxide and titanium dioxide [34][35][36].…”
Section: Ion Track Projection Lithographymentioning
confidence: 99%
“…Edge definition and surface smoothness increase with ion fluence, with superb quality reached at 10 9 -10 10 ions cm −2 (Thornell et al, 1999). The depth of the structure is controlled by the energy of the ion beam.…”
Section: Technological Applications Including Ion Track Microtechnologymentioning
confidence: 99%