A strontium titanate (SrTiO3) thin film on a heavily doped n-type silicon wafer prepared by sputtering was characterized by various means. The result indicated that the thin film mainly consisted of an 87-nm-thick amorphous SrTiO3 with a Sr:Ti:O ratio of 1:1.3:4.7, a dielectric constant of ε
r=12.1, and a leakage current density of 0.2 nA/cm2 at an electric field of 1 MV/cm. Pentacene field-effect transistors fabricated using the SrTiO3 thin film as an insulator, showed well-saturated output characteristics at low driving voltages (V
D=-3 V), and a hole mobility of 0.08 cm2 V-1 s-1, an on/off current ratio of 104, and threshold voltage of -0.7 V.