2003
DOI: 10.1016/j.jcrysgro.2003.07.025
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Microstructural evolution of Ge/Si(100) nanoscale islands

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Cited by 35 publications
(20 citation statements)
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“…36 Neglecting compositional nonuniformity, it has been estimated that the actual Ge concentrate in the islands is x = 0.82 and 0.43, respectively, at 450°C and 700°C. 37 This gives a very preliminary estimate for the scaling exponent Ӎ 2.2 consistent with the asymptotic value = 2 derived above, although more experiments are required for a reliable conclusion.…”
Section: Discussionsupporting
confidence: 82%
“…36 Neglecting compositional nonuniformity, it has been estimated that the actual Ge concentrate in the islands is x = 0.82 and 0.43, respectively, at 450°C and 700°C. 37 This gives a very preliminary estimate for the scaling exponent Ӎ 2.2 consistent with the asymptotic value = 2 derived above, although more experiments are required for a reliable conclusion.…”
Section: Discussionsupporting
confidence: 82%
“…In particular, the vertical concentration profile and lateral uniformity in the dome island is in excellent agreement with an EELS study of the Ge island concentration of dome islands as a function of temperature. 15 The results are also in agreement with the anomalous x-ray scattering measurements 16 that showed a rapid increase of the Ge concentration in the dots in the first 2 nm from the surface. The line profiles parallel to the surface are useful to determine whether the dots can be modelled by a shell model with the Ge composition decreasing radially towards the centre of the dot or by a lamellar structure where the Ge gradient is perpendicular to the dot/substrate interface.…”
Section: A Ge Pyramid and Dome Dotssupporting
confidence: 89%
“…However, there is still a controversial matter with the origin of the anisotropic shape because an intermixing between nanocrystals and substrates partially and locally can relax the elastic strain. The intermixing makes the growth process of nanocrystals very complex in cases of Ge/Si [10] and InAs/GaAs [11].…”
Section: Introductionmentioning
confidence: 99%