Microstructure and magnetic properties of FeCoHfN thin films deposited by DC reactive sputtering

Li, Tianyuan; Liu, Xiyang; Li, Jiawei; Pan, Lining; He, Aina; Dong, Yaqiang

doi:10.1016/j.jmmm.2021.168777

Cited by 9 publications

(4 citation statements)

References 44 publications

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“…Soft magnetic thin films have been widely used for low-frequency devices such as transformers, generators, motors, and high-frequency applications. Recently, the research focused on soft magnetic thin films operating on high frequency in order to miniaturize and integrate microelectronic devices [1]. The designer and developers of modern electronic devices seek small-size, lightweight, high-speed, and cost-effective devices.…”

Section: Introductionmentioning

confidence: 99%

Influence of Phosphorus Content and Magnetic Annealing on Soft Magnetic Properties of Electrodeposited Amorphous FeMnP Alloy Films

Izerimana¹,

Ma²,

Wu³

et al. 2023

MSCE

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In this work, we investigated the influence of phosphorus and magnetic anneal on the soft magnetic properties of electrodeposited FeMnP alloy films prepared by changing sodium hypophosphite concentrations. X-ray diffraction radiation patterns showed an amorphous structure of electrodeposited alloy films. The saturation magnetization and coercivity value decreased from 586 emu/cc to 346 emu/cc, and 52 Oe to 18 Oe, with the P content increased, respectively. The absorption resonance peak became broad as the P content increased, and the natural resonance frequency decreased from 1.8 GHz to 0.6 GHz, with the P content increasing. Magnetic annealing of samples reduced the magnetic damping, and natural resonance frequency increased by about 1.8 GHz and 3.5 GHz for the sample with lower and higher P content. The film structure with lower P content changed at 300˚C, while the structure remains unchanged for the films with higher P content. Thus, the crystallization temperature could depend on the P content in the film. FeMnP alloy films could be used in high-frequency devices.

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Section: Introductionmentioning

confidence: 99%

Influence of Phosphorus Content and Magnetic Annealing on Soft Magnetic Properties of Electrodeposited Amorphous FeMnP Alloy Films

Izerimana¹,

Ma²,

Wu³

et al. 2023

MSCE

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“…AGNETO-ELECTRIC (ME) materials which possess both magnetic and electric properties have attracted much attention for their applications such as magnetic memory and magnetic sensors. Magnetic metal-insulator nanogranular films, which consist of nanometer-sized magnetic metal (e.g., Co, Fe) granules embedded in an insulating (e.g., MgF 2 , Al 2 O 3 ) matrix, belong to ME materials and exhibit a variety of intriguing functionalities: high-frequency soft magnetic properties [1]- [3], Hall effect [4]- [6], tunnel magnetoresistance effect [7]- [9], tunnel magneto optic effect [10], and giant Faraday effect [11]. Additionally, our group discovered a new ME effect, tunneling magneto-dielectric (TMD) effect, which causes a magnetic field-induced increase in the dielectric permittivity of nanogranular films [12].…”

Section: Introductionmentioning

confidence: 99%

Effect of Ar–N₂ Sputtering Gas on Structure and Tunneling Magnetodielectric Effect in Co–(Si–N) Nanogranular Films

et al. 2023

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We have investigated the effect of N2 fraction x in Ar-N2 sputtering gas on the tunneling magneto-dielectric (TMD) effect in Co-(Si-N) nanogranular films. Co-(Si-N) films were deposited by co-sputtering Co and Si3N4 targets in Ar-x vol.%N2 mixture gas with different N2 gas fractions x of 0 to 30. All deposited films had a nanogranular structure composed of Co nanogranules with a diameter of 1 to 3 nm embedded in an Si-N matrix. We realized the TMD effect in the films for x ≥ 3.3, and the film deposited in Ar-6.6 vol.%N2 gas showed the highest dielectric variations in a magnetic field. For 3.3 ≤ x ≤ 10, TMD peak frequency fTMD decreased from 17 MHz to 40 kHz with increasing x because of the increase in intergranular spacing s. On the other hand, for 10 < x ≤ 30, fTMD increased from 40 kHz to 3.3 MHz as x increased since both s in the out-of-plane direction and β, which indirectly represents the measure of the distribution of s, decreased. This study provides a new way to tailor the frequency response of the TMD effect.

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“…With the development of the electronic information industry, the high frequency, miniaturization and integration are required for the electronic devices [ 1 , 2 , 3 ]. According to the Snoek’s limit, the initial permeability is inversely proportional to the ferromagnetic resonance frequency under a certain saturation magnetization [ 4 ].…”

Section: Introductionmentioning

confidence: 99%

The Preparation of High Saturation Magnetization and Low Coercivity Feco Soft Magnetic Thin Films via Controlling the Thickness and Deposition Temperature

Yang

Liu

et al. 2022

Materials

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FeCo thin films with high saturation magnetization (4 pMs) can be applied in high-frequency electronic devices such as thin film inductors and microwave noise suppressors. However, due to its large magnetocrystalline anisotropy constant and magnetostrictive coefficient of FeCo, the coercivity (Hc) of FeCo films is generally high, which is detrimental to the soft magnetic properties. Meanwhile, the thickness and deposition temperature have significant effects on the coercivity and saturation magnetization of FeCo films. In this paper, FeCo thin films with different thicknesses were prepared by magnetron sputtering at different temperatures. The effects of thickness and deposition temperature on the microstructure and magnetic properties of FeCo thin films were systematically studied. When the film thickness increases from 50 nm to 800 nm, the coercivity would decrease from 309 Oe to 160 Oe. However, the saturation magnetization decreases from 22.1 kG to 15.3 kG. After that, we try to further increase the deposition temperature from room temperature (RT) to 475 °C. It is intriguing to find that the coercivity greatly decreased from 160 Oe to 3 Oe (decreased by 98%), and the saturation magnetization increased from 15.3 kG to 23.5 kG (increased by 53%) for the film with thickness of 800 nm. For the film with thickness of 50 nm, the coercivity also greatly decreased from 309 Oe to 10 Oe (decreased by 96%), but the saturation magnetization did not change significantly. It is contributed to the increase of deposition temperature, which will lead to the increase of grain size and the decrease of the number of grain boundaries. And the coercivity decreases as the number of grain boundaries decreases. Meanwhile, for the thicker films, when increasing the deposition temperature the thermal stress increases, which changes the appearance of (200) texture, and the saturation magnetization increases. Whereas, it has a negligible effect on the orientation of thin films with small thickness (50 nm). This indicates that high-temperature deposition is beneficial to the soft magnetic properties of FeCo thin films, particularly for the films with larger thickness. This FeCo thin film with high saturation magnetization and low coercivity could be an ideal candidate for high-frequency electronic devices.

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Microstructure and magnetic properties of FeCoHfN thin films deposited by DC reactive sputtering

Cited by 9 publications

References 44 publications

Influence of Phosphorus Content and Magnetic Annealing on Soft Magnetic Properties of Electrodeposited Amorphous FeMnP Alloy Films

Influence of Phosphorus Content and Magnetic Annealing on Soft Magnetic Properties of Electrodeposited Amorphous FeMnP Alloy Films

Effect of Ar–N₂ Sputtering Gas on Structure and Tunneling Magnetodielectric Effect in Co–(Si–N) Nanogranular Films

The Preparation of High Saturation Magnetization and Low Coercivity Feco Soft Magnetic Thin Films via Controlling the Thickness and Deposition Temperature

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Microstructure and magnetic properties of FeCoHfN thin films deposited by DC reactive sputtering

Cited by 9 publications

References 44 publications

Influence of Phosphorus Content and Magnetic Annealing on Soft Magnetic Properties of Electrodeposited Amorphous FeMnP Alloy Films

Influence of Phosphorus Content and Magnetic Annealing on Soft Magnetic Properties of Electrodeposited Amorphous FeMnP Alloy Films

Effect of Ar–N2 Sputtering Gas on Structure and Tunneling Magnetodielectric Effect in Co–(Si–N) Nanogranular Films

The Preparation of High Saturation Magnetization and Low Coercivity Feco Soft Magnetic Thin Films via Controlling the Thickness and Deposition Temperature

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Effect of Ar–N₂ Sputtering Gas on Structure and Tunneling Magnetodielectric Effect in Co–(Si–N) Nanogranular Films