1992
DOI: 10.1109/16.141251
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Modeling submicrometer GaAs MESFETs using PISCES with an apparent gate-length-dependent velocity-field relation

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Cited by 4 publications
(5 citation statements)
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“…The peak average kinetic energy of electrons calculated is about 0.7 eV comparable with Monte Carlo result, although it is shifted due to velocity-field relationship. We have used a fileddependent mobility relationship (Fardi and Hayes, 1992). We conclude that our model is somewhat limited because the mobility model is independent of the carrier-temperature.…”
Section: Ballistic Diodementioning
confidence: 99%
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“…The peak average kinetic energy of electrons calculated is about 0.7 eV comparable with Monte Carlo result, although it is shifted due to velocity-field relationship. We have used a fileddependent mobility relationship (Fardi and Hayes, 1992). We conclude that our model is somewhat limited because the mobility model is independent of the carrier-temperature.…”
Section: Ballistic Diodementioning
confidence: 99%
“…Not shown is the electron quantized energy level, calculated at 0.0254 eV above the conduction data dark I-V characteristics of a single QW Al 0.34 Ga 0.66 As/GaAs p-i-n photodiode. The measured data is taken from Fardi and Hayes (1992). An energy relaxation lifetime 1ps and a SRH recombination lifetime of 1ns were used…”
Section: Algaas/gaas P-i-n Quantum Wellmentioning
confidence: 99%
“…Note that the channel current I d in ( 12) is a function of s through y 1 and y 2 described by (7) and (8). So long as the gate contact is devoid of an interfacial oxide layer and interface states, the evaluation of the channel current density is straightforward.…”
Section: Features Of the Drain Current-voltage Characteristicsmentioning
confidence: 99%
“…The effect of the presence of trapping states on the electrical characteristics of metal-semiconductor field effect transistors has been the subject of considerable interest in the recent past [1][2][3][4][5][6][7][8][9][10][11][12][13][14]. So far two types of state have been considered for the purpose of device modelling, namely, the deep-impurity states in the semiconductor [1][2][3][4] and interface states at the gate contact of the device [12][13][14].…”
Section: Introductionmentioning
confidence: 99%
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