“…The two circuits reported to date [69], [70] used the MSM barrier enhancement layer to isolate the HEMT from the MSM, and also for HEMT-HEMT isolation. In [69], a 200 nm Fedoped InP was used for the bamer enhancement layer (Fe acceptor levels pin the Fermi level at about midgap) and in [70], 150 nm of lattice-matched InAlAs, followed by 200 nm of InAlGaAs grading to InGaAs.…”