Morphology of periodic nanostructures for photonic crystals grown by glancing angle deposition

Theoretical and experimental characterization of TiO2 thin films deposited at oblique angles

“…In general, these microstructures are caused by the shadowing of the deposition flux when arriving at the growing film, which makes tall surface features prevent the deposition under their shadow. This produces a competitive growth among surface motives, which ends up in the development of tilted structures oriented towards the incoming deposition flux [6][7][8][9][10][11][12][13][14][15][16][17][18][19]. The use of these thin films as a host for the development of nanostructured composite materials is another potential application quite dependent on the final topology of the films that has been widely investigated by our group [20][21][22][23].…”

Periodically arranged Si nanostructures by glancing angle deposition on patterned substrates

“…If electron beam lithography (EBL) is used to pattern templates for subsequent GLAD growth, most research work so far concentrated on dot-like seeds forming tetragonal arrays with specific periods d (center-to-center distance of nearest neighbors) [9][10][11][12][13][14][15]. Besides tetragonal lattices, other seed arrangements have been applied for GLAD as well, for instance triangular lattices [16], or quasi-one-dimensional line arrays, realized with photoresist lines on a substrate [17].…”

Optical characterization of pseudo‐ordered nanostructured thin films

“…Deposition pressures were typically below 10 -6 Torr . To further reduce column broadening, the phi-sweep method was used [9]; phi-sweep parameters were 12 nm sections with a 5 nm transition for a total pitch of 29 nm. Fig.…”