2000
DOI: 10.1109/55.817447
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MOSFET 1/f noise measurement under switched bias conditions

Abstract: A new measurement setup is presented that allows the observation of 1 noise spectra in MOSFET's under switched bias conditions in a wide frequency band (10 Hz-100 kHz). When switching between inversion and accumulation, MOSFET's of different manufacturers invariably show reduced 1 noise power density for frequencies below the switching frequency. At low frequencies (10 Hz), a 5-8 dB reduction in intrinsic 1 noise power density is found for different devices, largely independent of the switching frequency (up t… Show more

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Cited by 65 publications
(63 citation statements)
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(20 reference statements)
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“…In other words: if the measurement is fast enough, a possible contribution to the mismatch could be suppressed. This is very similar to other experiments where 1/f noise was shown to be reduced when large slow signal (switched measurements) was applied [76,77,78,79].…”
Section: Fast Pulsed I-v Measurementssupporting
confidence: 89%
See 1 more Smart Citation
“…In other words: if the measurement is fast enough, a possible contribution to the mismatch could be suppressed. This is very similar to other experiments where 1/f noise was shown to be reduced when large slow signal (switched measurements) was applied [76,77,78,79].…”
Section: Fast Pulsed I-v Measurementssupporting
confidence: 89%
“…Now the impact of interface state "preconditioning" is investigated by comparing pulsed-matching measurements obtained using different pre-soak conditions. Note that it is known from switched 1/f noise measurements that low-frequency noise, and thus most likely the underlying slow oxide traps, are affected by the pre-soak charging states of these traps [78,79]. Figure 3.23 presents fluctuation sweeps of pulsed measurements with the short pulses (1 碌s) but using different base levels.…”
Section: Pre-soak Level Comparisonmentioning
confidence: 99%
“…If these conditions are satisfied, a uniform distribution of traps in and results. To explain that turning a device on and off periodically leads to a decrease in the LF noise PSD [5]- [7], [42], we must conclude that the distribution of trap 's is not uniform in . This can be the distribution of 's in a large device with very many traps, but it can also be the distribution of 's over an ensemble of small devices, each with a limited number of traps.…”
Section: E Generalisation To Trap Distributionmentioning
confidence: 99%
“…Since trap densities in MOSFETs are commonly U-shaped in energy [43], [44], this explains that LF noise in MOSFETs decreases when the device is periodically turned on and off [5]- [7], [42]. A circuit designer may expect a large MOSFET to behave predictably in this way.…”
Section: E Generalisation To Trap Distributionmentioning
confidence: 99%
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