2012
DOI: 10.1016/j.apsusc.2012.02.050
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Nanoporous silicon membrane for fuel cells realized by electrochemical etching

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Cited by 7 publications
(3 citation statements)
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“…Besides that, the photolithography process also can be implemented in this system. The photolithography is a process of transferring pattern from reticle to photoresist film on wafer by exposing to the source of light through an optical mask . An optical mask is an opaque pattern on transparent support that is used to determine the features on the wafer .…”
Section: Working Principle and Fabrication Methods Of Membrane‐less Fmentioning
confidence: 99%
“…Besides that, the photolithography process also can be implemented in this system. The photolithography is a process of transferring pattern from reticle to photoresist film on wafer by exposing to the source of light through an optical mask . An optical mask is an opaque pattern on transparent support that is used to determine the features on the wafer .…”
Section: Working Principle and Fabrication Methods Of Membrane‐less Fmentioning
confidence: 99%
“…Porous silicon, solid silicon with voids therein, is one of the most important porous materials with a wide range of applications from batteries and fuel cells to drug delivery and diagnostics [1][2][3]. Although optoelectronics, especially light emission, has been porous silicon's primary area of interest for the last 25 years, the material has recently found its way to cosmetics, consumer care, nutrition, and food industry.…”
Section: Introductionmentioning
confidence: 99%
“…This research investigates the possible application of the neural network to model the porous silicon fabrication processes. Here in this work, ANN model can be improved simply by providing additional training data accurately in a shorter time to reduce the cost of experimental work for any practical application.Worth to mention that it can be used for nanotechnology based photonic devices and also nanotechnology based gas sensors [9].…”
Section: Introductionmentioning
confidence: 99%