2015
DOI: 10.1016/j.tsf.2015.02.040
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Nanostructures formed on carbon-based materials with different levels of crystallinity using oxygen plasma treatment

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Cited by 19 publications
(13 citation statements)
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“…The ablation process can be used, along with chemical surface modification, to create grooves along which the cells align themselves during adhesion [34,35]. The surface along the grooves becomes functionalized by oxygen groups and its roughness increases [36], which leads to an increased cell adhesion in the modified area.…”
Section: Laser Treatmentmentioning
confidence: 99%
“…The ablation process can be used, along with chemical surface modification, to create grooves along which the cells align themselves during adhesion [34,35]. The surface along the grooves becomes functionalized by oxygen groups and its roughness increases [36], which leads to an increased cell adhesion in the modified area.…”
Section: Laser Treatmentmentioning
confidence: 99%
“…2a-f). 18 At the beginning of plasma etching, the specimens did not show differences in the diameters and lengths of nanostructures, but the lengths of the nanostructures varied as oxygen plasma etching time increased ( Fig. 2g and i).…”
Section: Resultsmentioning
confidence: 88%
“…Therefore, as the center of the PET disc suffered from a lack of metal co-deposition, the height and distribution of the high-aspect-ratio nanostructures hardly managed to form uniformly over the large area. It has been reported that the concentration of metallic compounds on the polymeric surface corresponds to the roughness of the nanostructured surface 32 . As the size of the substrate is relatively larger than the cathode plate, the sputtered atoms, serving as the nanoscale etching mask, cannot reach the entire region on the target substrate.…”
Section: Resultsmentioning
confidence: 99%
“…Until 10 min of plasma treatment, the concentration of metal compounds from the co-deposition of sputtered atoms is not sufficient to form metallic clusters that act as a nanoscale etch mask, so the surface roughness is maintained at a low level of few nm. With increasing plasma treatment duration over 10 min, nanoscale bumps with a low aspect ratio evolve into nanopillar or nanohairy structures through further anisotropic etching, which is induced by the nanoscale etch masks 29,32 . The change in morphology of the nanostructure leads to roughness (R q ) increment to 40.9, 61.2, and 89.4 nm for the plasma treatment of 30, 40, and 60 min, respectively.…”
Section: Resultsmentioning
confidence: 99%
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