2013
DOI: 10.1063/1.4826091
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Neutron irradiation effects on gallium nitride-based Schottky diodes

Abstract: Depth-resolved cathodoluminescence spectroscopy (DRCLS), time-resolved surface photovoltage spectroscopy, X-ray photoemission spectroscopy (XPS), and current-voltage measurements together show that fast versus thermal neutrons differ strongly in their electronic and morphological effects on metal-GaN Schottky diodes. Fast and thermal neutrons introduce GaN displacement damage and native point defects, while thermal neutrons also drive metallurgical reactions at metal/GaN interfaces. Defect densities exhibit a … Show more

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Cited by 24 publications
(10 citation statements)
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References 42 publications
(52 reference statements)
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“…Trap state densities measured by t-SPS correlate with DRCLS intensities and display relatively good agreement 40 with Gür et al DLOS results, 30 as expected from previous DLOS/t-SPS comparisons. 41,42 Total DLOS deep level concentrations for x = 0%, 31%, 44%, 52%, and 56% of 50.6, 6.1, 6.8, 7.8, and 5.4 × 10 16 cm −3 , respectively, 30 also correlate with Figure 4(a). The bulk I(V C )/I(NBE) values for ZnO are consistent with positron annihilation spectroscopy (PAS) calibration values corresponding to ∼0.08 × 10 17 cm −3 in the bulk and 0.25 × 10 17 cm −3 at the surface.…”
supporting
confidence: 68%
“…Trap state densities measured by t-SPS correlate with DRCLS intensities and display relatively good agreement 40 with Gür et al DLOS results, 30 as expected from previous DLOS/t-SPS comparisons. 41,42 Total DLOS deep level concentrations for x = 0%, 31%, 44%, 52%, and 56% of 50.6, 6.1, 6.8, 7.8, and 5.4 × 10 16 cm −3 , respectively, 30 also correlate with Figure 4(a). The bulk I(V C )/I(NBE) values for ZnO are consistent with positron annihilation spectroscopy (PAS) calibration values corresponding to ∼0.08 × 10 17 cm −3 in the bulk and 0.25 × 10 17 cm −3 at the surface.…”
supporting
confidence: 68%
“…The existence of the threshold neutron fluence on the performance of GaN Schottky diodes was further validated by Lin,124 which found that fast neutrons with fluences !10 15 n/cm 2 increases deep level defects densities, while thermal neutron with fluences 10 15 n/cm 2 anneal these defects and improve the GaN crystalline quality. Their further studies 125 revealed that both fast and thermal neutrons introduce recombination centers in GaN, forming an insulating phase between GaN and metal contact, raising the Schottky contact ideality factor, increasing the Ohmic contact sheet resistance, and lowering the current transport for both contacts.…”
Section: à2mentioning
confidence: 99%
“…The A* variation with fast neutron irradiation fluence can be explained by the decrease of the surface defect density according to the t-SPS measurement results. 20 However, surface defect variations do not account for the deviation of A* from the theoretical value for devices under fast þ thermal neutron irradiation. An A* anomaly caused by metal/GaN interfacial chemical reaction has been reported by other researchers [31][32][33] which is sometimes accompanied with barrier height reduction.…”
Section: Electrical Resultsmentioning
confidence: 99%
“…[17][18][19] Recently, we described the effect of fast (1 MeV) and thermal (25 meV) neutron irradiation on GaN Schottky diodes. 20 That work focused on the defect densities and depth distributions produced by fast and thermal neutrons in epitaxial n-GaN after irradiation. Using a combination of depth resolved cathodoluminescence spectroscopy (DRCLS), surface photovoltage spectroscopy (SPS), transient (t-) SPS, and current-voltage (I-V) measurements, we showed that fast neutron fluences !10 15 n/cm 2 increased densities of deep level defects, specifically the well-known yellow band (YB) and blue band (BB) defects.…”
Section: Introductionmentioning
confidence: 99%
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