Nonequilibrium Plasmas Generated by Dielectric Barrier Discharges at Atmospheric Pressure

Tang, Jie; Zhao, Wei; Duan, Jiana; Duan, Yixiang

doi:10.1109/tps.2011.2159126

Cited by 10 publications

(5 citation statements)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Plasma polymerization has become an effective process for thin-film deposition in various academic=industrial areas 1,2) and for advances in the proliferation of interfaces on different composite materials. [3][4][5] This is because of the specific interaction of plasma-polymerized films with polymeric substrates, and the good adherence to various substrates. Besides the advantages of plasma-polymerized films, it is a challenging task to achieve large-area deposition with the desired chemical surface features.…”

Section: Introductionmentioning

confidence: 99%

Plasma polymerization of acrylic acid onto polystyrene by cyclonic plasma at atmospheric pressure

Chang

Lin

Huang

2015

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

The cyclonic atmospheric-pressure plasma is developed for chamberless deposition of poly(acrylic acid) film from argon/acrylic acid mixtures. The photoemission plasma species in atmospheric-pressure plasma polymerization was identified by optical emission spectroscopy (OES). The OES diagnosis data and deposition results indicated that in glow discharge, the CH and C2 species resulted from low-energy electron-impact dissociation that creates deposition species, but the strong CO emission lines are related to nondeposition species. The acrylic acid flow rate is seen as the key factor affecting the film growth. The film surface analysis results indicate that a smooth, continuous, and uniform surface of poly(acrylic acid) films can be formed at a relatively low plasma power input. This study reveals the potential of chamberless film growth at atmospheric pressure for large-area deposition of poly(acrylic acid) films.

show abstract

Section: Introductionmentioning

confidence: 99%

Plasma polymerization of acrylic acid onto polystyrene by cyclonic plasma at atmospheric pressure

Chang

Lin

Huang

2015

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

show abstract

“…The capability of atmospheric pressure plasma for film-thin deposition to meet these requirements was previously demonstrated. [3][4][5] However, owing to the high gas temperature in the discharge or the limited production of chemically active species, the use of atmospheric-pressure discharges has not yet to be widely realized compared with lowpressure systems. Therefore, low-temperature atmosphericpressure plasma systems are required.…”

Section: Introductionmentioning

confidence: 99%

Large-Area Organosilicon Film Deposition Using Cyclonic Atmospheric Pressure Glow Discharge

Lin

Tsai

Liu

et al. 2013

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

Cyclonic atmospheric pressure plasma is developed for chamberless deposition of organosilicon thin films from argon/hexamethyldisoxane (HMDSO) mixtures. The surface properties of the resulting plasma films were investigated as a function of RF plasma power. Film characterization was performed by static contact angle measurement, scanning electron microscopy (SEM), atomic forced microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). It was found the RF plasma power is the key factor that to affects the film growth in the atmospheric pressure plasma chemical vapor deposition process. SEM and AFM results indicated that a smooth, continuous, and uniform surface of organosilicon thin films can be formed at a relatively low plasma power input. XPS indicated that atmospheric-pressure plasma-deposited organosilicon films present mainly inorganic characteristics. This study shows a potential of chamberless film growth at atmospheric pressure to form organosilicon thin films for large-area deposition.

show abstract

“…Th working gas Ar, precursor HMDSO, and fluorescent agent are transferred into the DBD reactor and mixed freely. Driven by the nanosecond pulse, electrons and neutral molecules are excited, and the active particles (hot electrons e*, Ar*, N 2 *, O 2 *) and HMDSO molecules in the plasma undergo Penning ionization, resulting in a large number of HMDSO fragments, − as shown in Figure a. It is noted that due to the concentrated electric field at the edge of the DBD reactor, the plasma inevitably has an edge effect, that is, the plasma reaction is stronger at the edge of the reactor.…”

Section: Discussionmentioning

confidence: 99%

Rapid Evaluation of Material Surface Modification by a Dielectric Barrier Discharge Based on Fluorescence Coloring and Image Processing Technologies

Zhu

Guan

et al. 2022

ACS Appl. Mater. Interfaces

View full text Add to dashboard Cite

In recent years, improving the surface properties of large-scale insulation by plasma modification has attracted extensive attention with the development of power systems and high-tech industries. However, routine evaluations of the modification effect and uniformity require complicated tests after the plasma is powered off, which waste a lot of time and cannot regulate the modification effect online. In this study, a novel fluorescence-assisted dielectric barrier discharge (DBD) for fabricating a functional film is developed, and a rapid evaluation method of the modification effect and uniformity is proposed based on fluorescence coloring and image processing technologies. The results show that the addition of an organic fluorescent agent in the DBD with hexamethyldisiloxane (HMDSO) has no negative effect on the plasma discharge and modification effect, and the fluorescence-assisted DBD successfully fabricates the functional films with typical chromogenic groups (N−H and S�O) that exhibit typical fluorescence under an UV lamp. According to image processing and parameter extraction, the plasma-assisted fluorescent film is converted into a two-dimensional (2D) color map with nine color levels, and three characteristic parameters are proposed to evaluate the modification effect rapidly and directly. It shows that the warmer the color of the treated sample, the better the hydrophobicity and electrical insulating properties, where the red region represents the optimally modified surface, while the blue region represents the worst one. The area, shape, and integrity of the plasma modification are clarified quantificationally, which provides the possibility of further online evaluation of the modification effect and uniformity by the plasma treatment.

show abstract

Nonequilibrium Plasmas Generated by Dielectric Barrier Discharges at Atmospheric Pressure

Cited by 10 publications

References 4 publications

Plasma polymerization of acrylic acid onto polystyrene by cyclonic plasma at atmospheric pressure

Plasma polymerization of acrylic acid onto polystyrene by cyclonic plasma at atmospheric pressure

Large-Area Organosilicon Film Deposition Using Cyclonic Atmospheric Pressure Glow Discharge

Rapid Evaluation of Material Surface Modification by a Dielectric Barrier Discharge Based on Fluorescence Coloring and Image Processing Technologies

Contact Info

Product

Resources

About