Novel Photobleachable Deep UV Resists Based on Single Component Nonchemically Amplified Resist System

Abstract

Summary: Photobleachable deep UV resists were designed by introducing diazoketo groups in polymer side chains. The diazoketo groups undergo the Wolff rearrangement upon irradiation in the deep UV, affording ketenes that react with water to provide base‐soluble photoproducts. The polymers were synthesized by radical copolymerization of 2‐(2‐diazo‐3‐oxo‐butyryloxy)‐ethyl methacrylate, 2‐hydroxyethyl methacrylate, and γ‐butyrolacton‐2‐yl methacrylate. The single component resist showed 0.7 µm line and space patterns using a mercury‐xenon lamp in a contact printing mode.Scanning electron micrograph of 0.7 µm line and space patterns printed with polymer B at a dose of 70 mJ · cm−2.imageScanning electron micrograph of 0.7 µm line and space patterns printed with polymer B at a dose of 70 mJ · cm−2.

Light‐Triggered Multifunctionality at Surfaces Mediated by Photolabile Protecting Groups

“…[125][126][127][128][129] These materials have been proposed as biocompatible photoresists for patterning cells, DNA, or proteins by subsequent functionalization with appropriate ligands.…”

Photo-patternable non-conductive adhesives (NCAs) for electronic packaging applications

“…Synthesis of photosensitive DOBEMA monomer DOBEMA was synthesized (from 2-(methacryloyloxy) ethyl acetoacetate and p-toluenesulfonyl azide) according to the reported procedure [4,5] with minor modification. yellow oily crude product was purified using silica gel flash column chromatography gave pure product DOBEMA as pale yellowish-green oil.…”

Novel Top‐Surface Imaging Process by Selective Chemisorption of Poly(dimethyl siloxane) on Diazoketo‐Functionalized Single Component Photoresist

“…[10] The monomer 2-(2-diazo-3-oxo-butyryloxy)ethyl methacrylate (DOBEMA) and its homopolymer were synthesized according to the reported procedure. [11] Instrumentation Chemical structures were determined by IR spectroscopy (BioRad FTS-165 FT-IR spectrometer) and 1 H and 13 C NMR spectroscopy (Bruker AM-300 FT-NMR-spectrometer). UV light irradiation was carried out using a deep UV exposure system (Oriel corporation model 82531) with a filter transmitting light between 220 and 260 nm.…”