Observation of a novel electron beam effect: electron-stimulated associative desorption

Campbell, J. H.; Bater, C.; Durrer, William; Craig, J.H.

doi:10.1016/s0040-6090(96)09544-2

Cited by 14 publications

(13 citation statements)

References 11 publications

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“…Desorption after electron dosing of the surface indicates that this system exhibits "electron-stimulated associative desorption" (ESAD) of N 2 . The ESAD mechanism has been reported for ammonia on both Pt(111) [15] and Si(100) [16]. The TPD results also suggest the likely involvement of NO dimers on the surface which then decompose to produce desorption of N 2 O.…”

Section: Discussionmentioning

confidence: 53%

NO adsorption on Ge(1 0 0) studied by TPD

Davies

Craig

2003

Applied Surface Science

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Section: Discussionmentioning

confidence: 53%

NO adsorption on Ge(1 0 0) studied by TPD

Davies

Craig

2003

Applied Surface Science

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“…This latter signal is ascribed to N 2 formed from NH 3 upon electron exposure. In multilayer films of NH 3 this reaction proceeds without thermal activation7 and is ascribed to the disproportionation of NH 2 radicals formed upon electron exposure 8. Taking into account that ions in the condensed phase are stabilized by typically 1 to 2 eV relative to the gas phase, NH 2 radicals can be produced here by the dissociative ionization of NH 3 yielding NH 2 + (gas‐phase threshold: 15–16 eV6) followed by neutralization by thermalized electrons during exposure.…”

Section: Methodsmentioning

confidence: 99%

Low‐Energy‐Electron‐Induced Hydroamination of an Alkene

2009

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The smallest catalyst: A new strategy to control chemical synthesis by exposure to low-energy electrons relies on the electrostatic attraction caused by the soft ionization of one of the reaction partners. This approach was used to induce a reaction between C(2)H(4) and NH(3) yielding aminoethane. The reaction resembles a hydroamination except that the electron beam replaces the catalyst used in the organic synthesis.

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“…In the case of ammonia on Pt(111), Campbell et al observed that electron irradiation of condensed ammonia led to thermal desorption of H 2 g and N 2 g , in a process characterized as 'electronstimulated associative desorption.' 24 Similarly, irradiation of NO multilayers on Ge(100) with 600 eV electrons resulted in, among other things, the production and thermal desorption of N 2 g . 25,26 Therefore, we interpret the appearance of the mass 2 peak at 155 K following electron irradiation of TMA multilayers on Si(100) as electron-induced associative desorption of hydrogen.…”

Section: Condensed Tmamentioning

confidence: 99%

HREELS, TPD and ESD study of electron‐induced decomposition of trimethylamine on Si(100) at 100 K

Lozano¹,

Early²,

Craig³

et al. 2005

Surface & Interface Analysis

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The effects of 600 eV electron irradiation on adsorbed layers of trimethylamine (TMA) on a Si(100) surface at 100 K were studied using high-resolution electron energy loss spectroscopy (HREELS), temperature programmed desorption (TPD), electron-stimulated desorption (ESD) and x-ray photoelectron spectroscopy (XPS). Experiments were performed at monolayer and higher coverages. The ESD results obtained on physisorbed TMA indicate electron-induced decomposition of the parent molecule. The HREELS data also show cleavage of N-C bonds on the chemisorbed layer of TMA and deposition of CH x groups on the surface, which is also supported by a dramatic enhancement of hydrogen desorption at 960 K following electron irradiation. This multiple-step process is supported by ESD signal decay curves obtained during electron irradiation. Following electron irradiation of TMA/Si(100), the intensity of low temperature TPD peaks corresponding to TMA fragments decreases; however, the intensity of the mass 2 peak increases dramatically compared with the un-irradiated surface. This is indicative of electron-induced associative desorption of molecular hydrogen. The HREELS data from monolayer coverage of TMA on Si(100) after electron irradiation suggests the removal of CH x groups from the adsorbate layer and deposition of carbon and hydrogen on the surface. In the absence of physisorbed layers there is no indication of electron-induced desorption of TMA fragments.

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Observation of a novel electron beam effect: electron-stimulated associative desorption

Cited by 14 publications

References 11 publications

NO adsorption on Ge(1 0 0) studied by TPD

NO adsorption on Ge(1 0 0) studied by TPD

Low‐Energy‐Electron‐Induced Hydroamination of an Alkene

HREELS, TPD and ESD study of electron‐induced decomposition of trimethylamine on Si(100) at 100 K

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