Oligomeric Products in Plasma=Polymerized Organosilicones

New insight into organosilicon plasma‐enhanced chemical vapor deposition layers and their crosslinking behavior by calculating the degree of Si‐networking

“…This group may also form during the plasma process. Some suggestions about the formation of carbon‐based linkages can be found in the literature [19] . As can be seen in Figure 8 (right), the common Si–O–Si network, which can be observed in FTIR and XPS is always included in all structural groups.…”

“…The presence of CH‐groups is possible but they might not be the main groups. Comparing the groups with HMDSO, it is much more likely that CH 2 groups are formed [19] . By taking the information about the physical properties into account, it can be estimated that there is a formation of carbon‐containing bridge‐building groups between the silicon atoms.…”

Gas diffusion barrier layers for transparent polymer packages for optical MEMS

“…Soll 4 and Wrobel et al 5 showed that Hexamethyldisiloxane (HMDSO) polymerises to glass-like layers in plasma. Depending on the oxygen content in the plasma, more or less hydrogen and methylgroups are seperated from the Si-O-Si-chain and oxidized to water or carbon mono-or dioxide.…”

Макрокинетика Коагуляции Субмикронных Частиц В Объеме Тлеющего Разряда

“…До на-стоящего времени не существует единого мнения о механизме формирования порошкообраз-ных частиц в объеме разряда, хотя из-за многообразия применяемых мономеров и условий по-лимеризации их возможно действительно существует несколько типов [1,2]. Тем не менее оче-видно, что в результате многочисленных сложных реакций с участием ионов, радикалов и воз-бужденных частиц получаются макромолекулы различных размеров и первичные частицы мо-гут иметь достаточно большой разброс по размерам и массе.…”