1973
DOI: 10.1016/0040-6090(73)90131-4
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On the formation and thermal stability of Bi2O3 films

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Cited by 16 publications
(2 citation statements)
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“…I n the case of platinum, the attack is less severe and not much contaminated films can be obtained [lo, 111. Another method which has been successfully applied is the reactive sputtering technique and good quality films have been obtained [4,6,12,131. Reactive evaporation of bismuth in an atmosphere of oxygen has been tried and good quality films have been obtained if the rate of deposition is kept below 0.02 nm/s [14]. Yet another method for the preparation of Bi,O, films is the oxidation of bismuth films in air [15 t o 171, but often this method yields a mixture of u-and P-phases.…”
Section: Introductionmentioning
confidence: 99%
“…I n the case of platinum, the attack is less severe and not much contaminated films can be obtained [lo, 111. Another method which has been successfully applied is the reactive sputtering technique and good quality films have been obtained [4,6,12,131. Reactive evaporation of bismuth in an atmosphere of oxygen has been tried and good quality films have been obtained if the rate of deposition is kept below 0.02 nm/s [14]. Yet another method for the preparation of Bi,O, films is the oxidation of bismuth films in air [15 t o 171, but often this method yields a mixture of u-and P-phases.…”
Section: Introductionmentioning
confidence: 99%
“…The instability of BFO during the growth of BFO−CFO nanocomposites thin films (as well as single phase BFO films) is not directly related to the volatility of Bi 2 O 3 (it decomposes at pressures close to 1 × 10 −6 mbar at 675 °C ), but directly of sublimation of Bi since its vapor pressure at 675 °C is slightly lower than 1 × 10 −2 mbar . Moreover, we stress that the reported vapor pressure are equilibrium data between a condensed phase and its vapor, whereas the heteroepitaxial growth of a two-phase nanocomposite is a more complex process, with the sticking probability of Bi adsorbed on CFO islands expected to be low, particularly when increasing deposition temperature.…”
Section: Resultsmentioning
confidence: 77%