1994
DOI: 10.1016/0167-9317(94)90086-8
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Optical beam testing and its potential for electronic device characterization

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Cited by 8 publications
(3 citation statements)
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“…De/tar = roaTCR (T -To) (1) Where ro and aTCR are respectively the resistivity and the temperature coefficient of metal resistance, T the temperature upon laser heating, and TOthe initial temperature of the metal. Fig 3. shows an example ofdirect Localization ofshort circuit in a BiCMOS device that presents a current leakage on some I/O (I > 100 rnA instead of!…”
Section: Invited Papermentioning
confidence: 99%
See 1 more Smart Citation
“…De/tar = roaTCR (T -To) (1) Where ro and aTCR are respectively the resistivity and the temperature coefficient of metal resistance, T the temperature upon laser heating, and TOthe initial temperature of the metal. Fig 3. shows an example ofdirect Localization ofshort circuit in a BiCMOS device that presents a current leakage on some I/O (I > 100 rnA instead of!…”
Section: Invited Papermentioning
confidence: 99%
“…A 1064nm wavelength laser source generates electron-hole pairs in the device active area 9781-4244-3912-6/09/$25.00 ©2009 IEEE that induces a detectable photocurrent injunctions. It allows the localization of junction defects with Optical Beam Induced Current (OBlC) [1], No Bias OBIC (NBOBIC) [2], Single Contact OBIC (SCOBIC) [3]. In addition, Gate opens can be localized by Laser Induced Voltage Alteration (UVA) [4] and Logic State Mapping can be imaged [5].…”
Section: Introductionmentioning
confidence: 98%
“…In the same way as light emission, the techniques based on laser stimulation have been mainly developed in failure analysis [8] [9]. On the one hand, the laser stimulation at a 1064 nm wavelength allows to induce a local photocurrent [10], either to detect a latch-up mechanism and inter-level shorts or to locate open circuits and direct semiconductor damage (LIVA, OBIC).…”
Section: Introductionmentioning
confidence: 99%