Optical properties of different polymer thin films containing in situ synthesized Ag and Au nanoparticles

Abargues, Rafael; Abderrafi, Kamal; Pedrueza, Esteban; Gradess, Rachid; Marqués-Hueso, José; Valdés, José Luís; Martínez‐Pastor, Juan P.

doi:10.1039/b900185a

Cited by 39 publications

(32 citation statements)

References 27 publications

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“…A clear peak appeared at 450 nm, due to the localized surface plasmon resonance of the silver NPs. This peak exhibited a broad tail in the entire visible spectrum, which is a common feature of samples with polydispersity of NP sizes, justifying the red hue of the patterns. Figure d shows the optical density of the films at 450 nm, revealing saturation for 10 min exposure.…”

Section: Resultsmentioning

confidence: 74%

A Rapid Photopatterning Method for Selective Plating of 2D and 3D Microcircuitry on Polyetherimide

Marqués-Hueso

Jones

Watson

et al. 2017

Adv Funct Materials

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In this work, a method for the rapid synthesis of metallic microtracks on polyetherimide is presented. The method relies on the photosynthesis of silver nanoparticles on the surface of the polymer substrates from photosensitive silver chloride (AgCl), which is synthesized directly on the polyetherimide surface. The study reveals that the use of AgCl as a photosensitive intermediate accelerates the reactions leading to the formation of silver nanoparticles by up to two orders of magnitude faster than other photodecomposition schemes. The patterning can be conducted under blue light, with notable advantages over UV exposure. Polymers of significant interest to the microelectronics and 3D printing industries can be directly patterned by light using this photography-inspired technique at throughputs high enough to be commercially advantageous. Light exposures as short as a few seconds are sufficient to allow the direct metallization of the illuminated polyetherimide surface. The results show that the silver required for the seed layer is minimal, and the later copper electroless plating results in the selective growth of conductive tracks for circuitry on the light-patterned areas, both on flexible films and 3D printed surfaces. direct metallization [4] of modified photoresists, [5] which has the advantage that it can be directly patterned by UV photolithography [6] without vacuum process steps for the metal deposition. DOIThe metallization of polyimides has received particular attention, due to their mechanical strength, biocompatibility, chemical resistance, and ability to withstand high temperatures. Different approaches have been followed to achieve this metallization, such as embedding silver nanowires, [7] decomposing metalorganic compounds [8] or the activation of a palladium seed layer for future plating. [9] One proposed methodology for the fabrication of metallic tracks on polyimides is surface modification by ion exchange and subsequent plating. [10] This method has the advantage of avoiding any vacuum processing steps. Moreover, the organometallic bonds can be selectively broken by irradiation, enabling direct light patterning. Finally, the use of a photoresist acting as a mold for electroplating can be removed from the manufacturing process. The nanoparticles (NPs) resulting from the photoreduction of the free metallic ions can then be used as seeds for subsequent plating. This also permits patterning by direct laser writing, [11] which could accommodate the selective plating of contoured, 3D surfaces.This manufacturing process has a plethora of advantages, but its industrial implementation has been held back as the photopatterning stage has been too slow to be implemented for mass production. Moreover, the exposure energy must be limited in order to avoid damage to the polymeric substrate. [12] These limitations have triggered a search for new processes in order to obtain faster nanoparticle formation.One approach has been to use assisted photoreduction of the metallic ions with a mild reducing agent [...

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Section: Resultsmentioning

confidence: 74%

A Rapid Photopatterning Method for Selective Plating of 2D and 3D Microcircuitry on Polyetherimide

Marqués-Hueso

Jones

Watson

et al. 2017

Adv Funct Materials

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“…2(b) shows UV-vis absorbance spectra of the polymer/Ag nanocomposites after a hard and soft bake. Ag NPs display localized surface plasmon resonance (LSPR) occurring near 400-500 nm [16]. Therefore, LSPR maxima occurring here indicates the presence and formation of Ag NPs during a hard bake for the three Ag(I) salt concentrations.…”

Section: Resultsmentioning

confidence: 84%

Selective Electroless Copper Deposition by Using Photolithographic Polymer/Ag Nanocomposite

Ryspayeva

Jones

Esfahani

et al. 2019

IEEE Trans. Electron Devices

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“…Optimal In 2 O 3 blends having a 5% PVP content (In 2 O 3 :5%PVP), which is the composition giving the best TFT results (vide infra), show a slightly higher E g of ca. 3.07 eV, probably due to the introduction of the high bandgap (>4 eV) polymer . The average transmittance values of the AryLite substrate and of the a‐ZITO/AryLite film are about 90% and 81% in the visible range (400–700 nm), respectively.…”

Section: Performance Metrics For Mo:pvp Tfts With Different Concentramentioning

confidence: 99%

Ultra‐Flexible, “Invisible” Thin‐Film Transistors Enabled by Amorphous Metal Oxide/Polymer Channel Layer Blends

et al. 2015

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Ultra-flexible and transparent metal oxide transistors are developed by doping In2 O3 films with poly(vinylphenole) (PVP). By adjusting the In2 O3 :PVP weight ratio, crystallization is frustrated, and conducting pathways for efficient charge transport are maintained. In2 O3 :5%PVP-based transistors exhibit mobilities approaching 11 cm(2) V(-1) s(-1) before, and retain up to ca. 90% performance after 100 bending/relaxing cycles at a radius of 10 mm.

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Optical properties of different polymer thin films containing in situ synthesized Ag and Au nanoparticles

Cited by 39 publications

References 27 publications

A Rapid Photopatterning Method for Selective Plating of 2D and 3D Microcircuitry on Polyetherimide

A Rapid Photopatterning Method for Selective Plating of 2D and 3D Microcircuitry on Polyetherimide

Selective Electroless Copper Deposition by Using Photolithographic Polymer/Ag Nanocomposite

Ultra‐Flexible, “Invisible” Thin‐Film Transistors Enabled by Amorphous Metal Oxide/Polymer Channel Layer Blends

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