2016
DOI: 10.1109/ted.2016.2601419
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Performance and Reliability of TiO2/ZrO2/TiO2(TZT) and AlO-Doped TZT MIM Capacitors

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Cited by 14 publications
(7 citation statements)
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“…The use of short-period superlattices i.e. nanolaminates is common in the high-κ field to enhance permittivity [77][78][79][80][81] ; in particular, rutile-structure TiO 2 is often paired with fluorite-structure HfO 2 and/or ZrO 2 in DRAM capacitors 82 . Recently, fluorite-structure nanolaminates were employed to tune the ferroelectric behavior of HfO 2 -ZrO 2 films [83][84][85] .…”
Section: Modelingmentioning
confidence: 99%
“…The use of short-period superlattices i.e. nanolaminates is common in the high-κ field to enhance permittivity [77][78][79][80][81] ; in particular, rutile-structure TiO 2 is often paired with fluorite-structure HfO 2 and/or ZrO 2 in DRAM capacitors 82 . Recently, fluorite-structure nanolaminates were employed to tune the ferroelectric behavior of HfO 2 -ZrO 2 films [83][84][85] .…”
Section: Modelingmentioning
confidence: 99%
“…[ 13,14 ] Moreover, from the commercial point of view, TiO 2 is one of the most recognized and capable candidates because of its abundant and inexpensive nature with environmentally safe (green) properties and has been used in various electronic devices applications. [ 14–16 ]…”
Section: Introductionmentioning
confidence: 99%
“…For the first approach, storage capacitors are converted from planar into three-dimensional (3D) structures to maximize their aspect ratios [3]. Regarding the second approach, various types of high- k materials are introduced such as ZrO 2 [4], TiO 2 [5], and SrTiO [6], which tends to deteriorate the defect density and bandgap energy [7]. This implies that state-of-the-art DRAM storage capacitors suffer from reliability issues such as leakage current and time-dependent dielectric breakdown (TDDB) [8].…”
Section: Introductionmentioning
confidence: 99%