Performance characteristics of the Varian Semiconductor VIISta 3000 single wafer high energy ion implanter

Thornton, Alexander L. F.; Chang, Shengwu; Hacker, D.

doi:10.1109/iit.2002.1258051

Cited by 3 publications

(2 citation statements)

References 8 publications

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“…As shown in Fig.1, the full beam line 3D optics model predicts the beam angle variations on VIISta3000 [1] [2]. All the beam optics elements are assembled together with their real position based on the mechanical model.…”

Section: Beam Optics Modelmentioning

confidence: 99%

True Zero Degree Incident Implants on VIISta3000

Chang¹,

Chavva²,

Sinclair³

2011

AIP Conference Proceedings

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The deliberate use of channeling to control depth profiles has come of age in the application to CMOS imaging sensor device manufacturing. In order to enable the true zero implant application on VIISta3000, we have optimized beam incidence angle control, using beam optics models and experimental measurements. The experiment measurement and the beam optics analysis results agree, showing a variation of less than 0.03° (1σ) across the wafer and from wafer to wafer. Achieving this accuracy in a manufacturing environment requires careful calibration and tight control of the collimator magnet and the mechanical scan system. In this paper we discuss the root cause of beam incidence angle variation on VIISta3000 and explain the calibration and optimization used to insure the consistent minimized beam incidence angle. We show experimental data, including ThermaWave and SIMS profiles.

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Section: Beam Optics Modelmentioning

confidence: 99%

True Zero Degree Incident Implants on VIISta3000

Chang¹,

Chavva²,

Sinclair³

2011

AIP Conference Proceedings

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show abstract

“…The VIISta 3000 is a high energy implanter while the 810HP serves the medium current segment of the implant market. Both the VIISta 3000 [2][3][4] and the VIISta 810HP [5] have been described thoroughly elsewhere. This paper will describe the goals of the source design and the performance of the IHC ion sources.…”

Section: Introductionmentioning

confidence: 99%