2015
DOI: 10.1109/tcsii.2015.2391632
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Performance Comparisons Between 7-nm FinFET and Conventional Bulk CMOS Standard Cell Libraries

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Cited by 61 publications
(14 citation statements)
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“…Nevertheless, a high reduction of the switching activity will lead to high dynamic power reduction. Considering that in the state-of-the-art Fin-FET technology the dynamic power dominates the static one [49], a high decrease of the dynamic power will compensate the static power of the approximate switches and eventually the total power consumption will decrease significantly. However, due to the added logic gates, the power increases when operating at the accurate level.…”
Section: Figurementioning
confidence: 99%
See 1 more Smart Citation
“…Nevertheless, a high reduction of the switching activity will lead to high dynamic power reduction. Considering that in the state-of-the-art Fin-FET technology the dynamic power dominates the static one [49], a high decrease of the dynamic power will compensate the static power of the approximate switches and eventually the total power consumption will decrease significantly. However, due to the added logic gates, the power increases when operating at the accurate level.…”
Section: Figurementioning
confidence: 99%
“…Power Model: The power consumption of a circuit can be approximated by the sum of the power consumption of the circuit's gates [49], [53]:…”
Section: B Proposed C-level Power and Error Evaluationmentioning
confidence: 99%
“…Various silicon and nonsilicon channel‐based transistors have been developed to pave the way for device scaling beyond Moore's law 8‐12 . The FinFET device with higher controllability over the gate region, improved I ON /I OFF ratio, mitigation of the threshold voltage variations by the elimination of the random dopant fluctuations, and the possibility of successful scaling to sub‐10‐nm technology nodes has been raised as a groundbreaking candidate for representing high‐performance ultrascaled VLSI circuits and systems 13,14 …”
Section: Introductionmentioning
confidence: 99%
“…[8][9][10][11][12] The FinFET device with higher controllability over the gate region, improved I ON /I OFF ratio, mitigation of the threshold voltage variations by the elimination of the random dopant fluctuations, and the possibility of successful scaling to sub-10-nm technology nodes has been raised as a groundbreaking candidate for representing high-performance ultrascaled VLSI circuits and systems. 13,14 Arithmetic blocks such as adders and multipliers are the most essential building blocks of the digital microprocessors and microsystems. Multipliers are one the most power-hungry units, which directly influence the overall performance of the computing systems.…”
Section: Introductionmentioning
confidence: 99%
“…reach 0.75 V and 0.7 V for 10 nm and 7 nm respectively [5]. One of the approaches to reduce leakage current is the use of gate-source/drain underlap, but because it increases the series resistance R SD , it will apparently decrease the driving current [6], [7]. Equating the fin width to the gate length can suppress the SCEs without affecting the driving current as found in [8].…”
Section: Introductionmentioning
confidence: 99%