2008
DOI: 10.1021/ac800246q
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Plasma-Deposited Fluorocarbon Films: Insulation Material for Microelectrodes and Combined Atomic Force Microscopy−Scanning Electrochemical Microscopy Probes

Abstract: Pinhole-free insulation of micro- and nanoelectrodes is the key to successful microelectrochemical experiments performed in vivo or in combination with scanning probe experiments. A novel insulation technique based on fluorocarbon insulation layers deposited from pentafluoroethane (PFE, CF3CHF2) plasmas is presented as a promising electrical insulation approach for microelectrodes and combined atomic force microscopy-scanning electrochemical microscopy (AFM-SECM) probes. The deposition allows reproducible and … Show more

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Cited by 20 publications
(23 citation statements)
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“…If variations in the height of sample features are large compared to the tip/substrate gap distance, it becomes very difficult to distinguish differences in UME current caused by topology rather than electrochemical activity. When the desired UME tip/substrate separation distance is comparable to the roughness of the sample surface, several advanced versions of SECM may be employed, including scanning-force microscopy, 64 hybrid SECM/atomic-force microscopy (AFM), 65,66 intermittent-contact SECM, [61][62][63] and electron transfer/ion transfer SECM. 67 Although this section has focused on the implementation of SECM for the analysis of the spatial variation of product formation on photoelectrode surfaces, SECM can also be used to investigate local changes in pH 68 and corrosion processes, [69][70][71][72][73][74] analyze surface coverage of adsorbed intermediates (surface interrogation SECM), [75][76][77][78][79] and measure short-lived intermediates.…”
Section: Scanning Electrochemical Microscopymentioning
confidence: 99%
“…If variations in the height of sample features are large compared to the tip/substrate gap distance, it becomes very difficult to distinguish differences in UME current caused by topology rather than electrochemical activity. When the desired UME tip/substrate separation distance is comparable to the roughness of the sample surface, several advanced versions of SECM may be employed, including scanning-force microscopy, 64 hybrid SECM/atomic-force microscopy (AFM), 65,66 intermittent-contact SECM, [61][62][63] and electron transfer/ion transfer SECM. 67 Although this section has focused on the implementation of SECM for the analysis of the spatial variation of product formation on photoelectrode surfaces, SECM can also be used to investigate local changes in pH 68 and corrosion processes, [69][70][71][72][73][74] analyze surface coverage of adsorbed intermediates (surface interrogation SECM), [75][76][77][78][79] and measure short-lived intermediates.…”
Section: Scanning Electrochemical Microscopymentioning
confidence: 99%
“…A number of such images have emerged from the Kranz group using the recessed Pt ring probe, 39,46,47 and more recently by extending this conguration to a boron-doped diamond (BDD) ring electrode. A number of such images have emerged from the Kranz group using the recessed Pt ring probe, 39,46,47 and more recently by extending this conguration to a boron-doped diamond (BDD) ring electrode.…”
Section: Afm Positioningmentioning
confidence: 99%
“…13,19-22 So far, combining AFM with SECM requires customized solutions as limited commercial SECM modules for AFM systems are available and, therefore, the technology only is used by a limited number of researchers. In addition, fabrication of combined probes remains challenging.…”
Section: Introductionmentioning
confidence: 99%