1995
DOI: 10.1179/mst.1995.11.11.1207
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Polysiliconin situphosphorus doping control over large concentration range using low temperature, low pressure chemical vapour deposition growth process

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Cited by 16 publications
(15 citation statements)
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“…Beyond that range resistivity decreases following the same doping effect as in crystalline silicon. The shape of the curve, quite similar to previously observed results for in-situ doped polysilicon layers [12,13], indicates that polysilicon NWs doping effect is in accordance with the Seto's theory [14]. In this model, the conduction is thermally activated.…”
Section: Resultssupporting
confidence: 86%
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“…Beyond that range resistivity decreases following the same doping effect as in crystalline silicon. The shape of the curve, quite similar to previously observed results for in-situ doped polysilicon layers [12,13], indicates that polysilicon NWs doping effect is in accordance with the Seto's theory [14]. In this model, the conduction is thermally activated.…”
Section: Resultssupporting
confidence: 86%
“…In this model, N* is related to the quality of the polysilicon layer both through the defects density at the grain boundaries and the lateral grain size. In our case N* ~ 10 18 cm -3 , corresponding to the value obtained for previous studies [12][13][14]. These results show that this electrical conduction model can be applied for polysilicon NWs at high temperatures.…”
Section: Resultssupporting
confidence: 76%
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“…A complete study of the phosphorus doping of polysilicon under the experimental conditions described above has been carried out and the results are reported elsewhere [4,5]. No significant inhomogeneities are observed.…”
Section: Boron Doping For P-type Polysilicon Layersmentioning
confidence: 99%