The present work involves the study of crystalline structure and surface morphology of Titanium Dioxide (TiO 2 ) thin film deposited by RF magnetron sputtering. TiO 2 thin film was grown on ITO coated glass substrate using Ti metal target. The XRD results revealed the crystalline structure and indicated that the deposited film had the intensities of metastable anatase phase. The surface morphology and its roughness values suggest that the film had smooth surface and densely packed with grains.