2017
DOI: 10.1117/12.2260053
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Printability and actinic AIMS review of programmed mask blank defects

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Cited by 4 publications
(3 citation statements)
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“…The deformed multilayer no longer exhibits ideal mirror-like reflection for incident light, scattering light in all possible directions. This alteration in the amplitude and phase of the reflected light field from the multilayer ultimately impacts the quality of lithography imaging 6,7 .…”
Section: Introductionmentioning
confidence: 99%
“…The deformed multilayer no longer exhibits ideal mirror-like reflection for incident light, scattering light in all possible directions. This alteration in the amplitude and phase of the reflected light field from the multilayer ultimately impacts the quality of lithography imaging 6,7 .…”
Section: Introductionmentioning
confidence: 99%
“…Phase defects arise inside the Mo/Si multilayers or on the substrate. And due to the high level of deposition process of multilayer films, defects on the substrate or the contamination particles from the coating process may cause subsequent coating layer deformation and approximately Gaussian-like structure growth, which eventually results in a phase shift and pattern failure during EUV lithography [3] [4]. Hence, using the actinic inspection tool to inspect and analyze such defects is of great significance for supervising mask fabrication and assisting mask repair [5][6] [7].…”
Section: Introductionmentioning
confidence: 99%
“…The feature sizes that have to be inspected and reviewed are becoming smaller with advanced mask materials. For these reasons, continuous development of the inspection technology is necessary to enable further progress of EUVL for future technology nodes [1][2][3][4]. RESCAN (Reflective-mode Scanning microscope) is a synchrotron-based APMI technology platform operating at the XIL-II beamline of the Swiss light source at PSI [5,6].…”
Section: Introductionmentioning
confidence: 99%