Projection Photolithography Utilizing a Schwarzschild Microscope and Self-Assembled Alkanethiol Monolayers as Simple Photoresists

Behm, Jane M.; Lykke, Keith R.; Pellin, Michael J.; Hemminger, John C.

doi:10.1021/la950811u

Cited by 53 publications

(52 citation statements)

References 21 publications

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“…Understanding the photoreactivity of SAMs is important for optimizing photoresist patterning processes involving SAMs. [7][8][9][10][11] As the feature sizes in lithography continue to scale down, there is an increasing demand on the resist films in terms of thickness and structural uniformity. [12][13][14][15] SAMs are an attractive candidate for nanoscale resists due to their molecular thickness and well-defined structure on nanometer length scales, which in principle should enable nanometer resolution in pattern transfer.…”

Section: Introductionmentioning

confidence: 99%

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

McArthur

Borguet

2005

J. Phys. Chem. B

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A molecular level understanding of the photoreactivity of self-assembled monolayers (SAMs) becomes increasingly important as the spatial resolution starts to be limited by the size of the resist and the spatial extent of the photochemical reactions in photoresist micropatterning. To this end, a number of surface characterization techniques were combined to understand the reactive agents, reactive sites, kinetics, and reaction pathways in the UV photoreactivity of octadecylsiloxane (ODS) SAMs. Quantitative analysis of our results provides evidence that ground state atomic oxygen is the primary reactive agent for the UV degradation of ODS SAMs. UV degradation, which follows zero-order kinetics, results in the scission of alkyl chains instead of the siloxane headgroups. Our results suggest that the top of the ODS SAMs is the preferential reactive site. Using a novel, highly surface sensitive technique, fluorescence labeling of surface species, we identified the presence of submonolayer quantities chemical functional groups formed by the UV degradation. These groups are intermediates in a proposed mechanism based on hydrogen abstraction.

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Section: Introductionmentioning

confidence: 99%

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

McArthur

Borguet

2005

J. Phys. Chem. B

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“…Irradiation of SAMs of alkanethiolates on exposure to UV light radiation through a pattern of apertures leads to the photo-oxidation of SAMs [380,381]. The oxidized materials can be removed by dissolving them into a polar solvent like water, ethanol, etc.…”

Section: Sam Patterning By Photolithographymentioning

confidence: 99%

“…In the case of a projection microscope using a mercury lamp as a UV light source, the resolution limit is~0.3 μm [382]. Exposure times of 15-20 mins are required for power densities of~5 W/cm 2 at the sample surface [1,380].…”

Section: Sam Patterning By Photolithographymentioning

confidence: 99%

Silicon Based Nanocoatings on Metal Alloys and Their Role in Surface Engineering

Bhure¹,

Mahapatro

2010

Silicon

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Metals and their alloys have been widely used in all aspects of science and engineering. However the science of nanotechnology is driving newer demands and requirements for better performance of existing materials and also at a higher level of precision. This is naturally presenting complicated demands on the surface of these metals with a need for surface modification. Self Assembled Monolayers (SAMs) are nanosized coatings that present the most efficient method of carrying out surface modification. Alkylsilanes are silicon based SAMs which are compatible with the majority of metals and alloys. These nanocoatings can serve primary functions such as surface coverage, etch protection and anti corrosion, along with a host of other secondary chemical functions because of their amphiphilic nature. We present a brief introduction to surface modification of metals and alloys followed by a detailed description of silane based nanocoatings and their applications in technology. Then a look at the engineering aspects of these coatings in terms of patterning techniques is presented along with a discussion of the applications of patterned SAMs.

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“…Well-established mechanical patterning schemes for SAMs are microcontact printing [5] as well as dip-pen lithography [6,7]. Optical lithography utilizes electromagnetic radiation in the UV [8][9][10] and X-ray [11] part of the spectrum to write patterns in SAMs. Electron beam lithography has attracted the interest of several groups due to the high resolution of this technique [12,13].…”

Section: Introductionmentioning

confidence: 99%

Patterned self-assembled monolayers of alkanethiols on copper nanomembranes by submerged laser ablation

Rhinow

Hampp

2012

Appl. Phys. A

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Self-assembled monolayers (SAMs) of alkanethiols are major building blocks for nanotechnology. SAMs provide a functional interface between electrodes and biomolecules, which makes them attractive for biochip fabrication. Although gold has emerged as a standard, copper has several advantages, such as compatibility with semiconductors. However, as copper is easily oxidized in air, patterning SAMs on copper is a challenging task. In this work we demonstrate that submerged laser ablation (SLAB) is well-suited for this purpose, as thiols are exchanged in-situ, avoiding air exposition. Using different types of ω-substituted alkanethiols we show that alkanethiol SAMs on copper surfaces can be patterned using SLAB. The resulting patterns were analyzed by atomic force microscopy (AFM) and scanning electron microscopy (SEM). Both methods indicate that the intense laser beam promotes the exchange of thiols at the copper surface. Furthermore, we present a procedure for the production of free-standing copper nanomembranes, oxidation-protected by alkanethiol SAMs. Incubation of copper-coated mica in alkanethiol solutions leads to SAM formation on both surfaces of the copper film due to intercalation of the organic molecules. Corrosion-protected copper nanomembranes were floated onto water, transferred to electron microscopy grids, and

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Projection Photolithography Utilizing a Schwarzschild Microscope and Self-Assembled Alkanethiol Monolayers as Simple Photoresists

Cited by 53 publications

References 21 publications

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Mechanism of UV Photoreactivity of Alkylsiloxane Self-Assembled Monolayers

Silicon Based Nanocoatings on Metal Alloys and Their Role in Surface Engineering

Patterned self-assembled monolayers of alkanethiols on copper nanomembranes by submerged laser ablation

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