2004
DOI: 10.1143/jjap.43.2203
|View full text |Cite
|
Sign up to set email alerts
|

Proposal of New Nonvolatile Memory with Magnetic Nano-Dots

Abstract: In this study, a new nonvolatile memory with magnetic nano-dots (MNDs) was proposed. A relatively large anisotropic change of gate current–voltage characteristics by the magnetization in magnetic non-volatile memory with Co nano floating gate and Ni-Fe control gate was obtained. A Co magnetic nano-dot film with very high dot density of 2×1013 cm-2 was successfully formed by sputtering with optimized target composition. A small anisotropic change of gate current–voltage characteristics by the magnetization in M… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
16
0

Year Published

2006
2006
2021
2021

Publication Types

Select...
8
1

Relationship

2
7

Authors

Journals

citations
Cited by 21 publications
(16 citation statements)
references
References 6 publications
0
16
0
Order By: Relevance
“…After a 10-nm-thick thermal oxide layer was grown by thermal oxidation as the tunneling oxide, the FePt nanodots for the first dot layer were dispersed in silicon oxide of 2 nm thickness and formed on the tunneling oxide by SAND. 17) Then, an inter-oxide of a 6-nm-thick sputter oxide layer was formed by RF sputtering. Also, an additional 2-nm-thick FePt nanodot layer was formed using the same SAND method and a following inter-tunnel oxide of a 6-nm-thick sputter oxide layer was formed by RF sputtering.…”
Section: Fabrication Of Multiple Fept Nanodot Structurementioning
confidence: 99%
See 1 more Smart Citation
“…After a 10-nm-thick thermal oxide layer was grown by thermal oxidation as the tunneling oxide, the FePt nanodots for the first dot layer were dispersed in silicon oxide of 2 nm thickness and formed on the tunneling oxide by SAND. 17) Then, an inter-oxide of a 6-nm-thick sputter oxide layer was formed by RF sputtering. Also, an additional 2-nm-thick FePt nanodot layer was formed using the same SAND method and a following inter-tunnel oxide of a 6-nm-thick sputter oxide layer was formed by RF sputtering.…”
Section: Fabrication Of Multiple Fept Nanodot Structurementioning
confidence: 99%
“…Here, metal oxide semiconductor (MOS) capacitors with a floating gate composed of multiple FePt nanodot layers by self-assembled nanodot deposition (SAND) were fabricated. 17) In addition, the effect of memory window for a nanodot diameter was investigated, and an FePt nanodot diameter was optimized for a larger memory window. Finally, for the samples with four FePt nanodot layers as a floating gate, data retention and endurance characteristics were evaluated.…”
Section: Introductionmentioning
confidence: 99%
“…Typical applications are already in progress, such as several crossbar approaches [29]- [46] that will allow us to construct molecular memories and logic, hopefully at extremely lower fabrication costs. On the other hand, magnetic storage devices, in which magnetic states are used to store information permanently, are also being developed [47]- [58].…”
Section: Aren't Computers Fast Enough?mentioning
confidence: 99%
“…By replacing nonmagnetic NDs with ferromagnetic NDs, floating gate MIS memories will exhibit new functionalities and improvements, including control of charging and discharging properties of the NDs floating gate and improved the retention characteristics due to the tunnel magnetoresistance effect between NDs and ferromagnetic gate electrodes. 11,12) Recently, the application of the magnetic NDs to spin-torque-driven memories and devices such as spin-transfer torque magnetoresistive random-access memories 13,14) and spin-transfer oscillators 15) has also attracted substantial attention due to their promise of high energy efficiency. However, for spintronic device applications, the formation of the magnetic NDs with high areal density and control of their magnetization properties are still major concerns.…”
Section: Introductionmentioning
confidence: 99%