2015
DOI: 10.1016/j.jallcom.2015.08.042
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Radiation treatment of Cd 2 SnO 4 thin films prepared by RF sputtering with different preparation conditions

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Cited by 11 publications
(7 citation statements)
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“…21 The conduction band edge position is closely matched with the conduction band minimum of TiO 2 . The structure and optical characteristics of cadmium stannate thin lms can be further tailored by gamma irradiation 21 and suitable dopants, such as In and Sb. 22 Furthermore, Cd 2 SnO 4 thin lms require costeffective preparation techniques including radio frequency magnetron sputtering, 23 sol-gel, 24 dip coating, 25 and spray pyrolysis.…”
Section: Introductionmentioning
confidence: 65%
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“…21 The conduction band edge position is closely matched with the conduction band minimum of TiO 2 . The structure and optical characteristics of cadmium stannate thin lms can be further tailored by gamma irradiation 21 and suitable dopants, such as In and Sb. 22 Furthermore, Cd 2 SnO 4 thin lms require costeffective preparation techniques including radio frequency magnetron sputtering, 23 sol-gel, 24 dip coating, 25 and spray pyrolysis.…”
Section: Introductionmentioning
confidence: 65%
“…[18][19][20] The thin lm has demonstrated an electron mobility and resistivity of up to 100 cm 2 V À1 s À1 and 1.28 Â 10 À4 U cm, respectively. 19,21 It is a n-type semiconductor material with a band gap of around 3.0 eV, in which oxygen vacancies act as donor states. 21 The conduction band edge position is closely matched with the conduction band minimum of TiO 2 .…”
Section: Introductionmentioning
confidence: 99%
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“…12 Among the ternary compounds, cadmium stannate (Cd 2 SnO 4 ) is an n-type semiconductor with an orthorhombic structure and an optical bandgap of approximately 3.0 eV. 13 This material possesses excellent thermal stability as well as strong ionic properties, which make it significant for many applications including the liquid crystal display smart windows, transparent electrodes, and photovoltaic generators. [14][15][16] So far, a variety of chemical and physical techniques, including spray pyrolysis method, 17 radio frequency magnetron sputtering technique, 18 and dip coating, 19 have been used to fabricate the Cd 2 SnO 4 films; however, only the polycrystalline structures of the Cd 2 SnO 4 thin films were observed via these techniques.…”
Section: Introductionmentioning
confidence: 99%
“…7 A variety of methods for preparing the Cd 2 SnO 4 lm were then attempted, including chemical vapor deposition (CVD) method, 8 pulsed laser deposition (PLD) method, 9 spray pyrolysis method, 10 sol-gel method, 11,12 electron beam evaporation method, 13 DC sputtering [14][15][16][17] and RF sputtering. [18][19][20][21] In many of the preparation methods, the CTO lms prepared by magnetron sputtering had the lowest resistivity, and the resistivity of lms prepared by various magnetron sputtering methods was much lower compared with other methods. In all experiments using magnetron sputtering to deposit CTO thin lms, we found that most of the deposited lms were heat treated, [22][23][24] and when the deposition atmosphere contained oxygen, the CTO lm can be a low resistance lm aer heat treatment.…”
Section: Introductionmentioning
confidence: 99%