“…7 A variety of methods for preparing the Cd 2 SnO 4 lm were then attempted, including chemical vapor deposition (CVD) method, 8 pulsed laser deposition (PLD) method, 9 spray pyrolysis method, 10 sol-gel method, 11,12 electron beam evaporation method, 13 DC sputtering [14][15][16][17] and RF sputtering. [18][19][20][21] In many of the preparation methods, the CTO lms prepared by magnetron sputtering had the lowest resistivity, and the resistivity of lms prepared by various magnetron sputtering methods was much lower compared with other methods. In all experiments using magnetron sputtering to deposit CTO thin lms, we found that most of the deposited lms were heat treated, [22][23][24] and when the deposition atmosphere contained oxygen, the CTO lm can be a low resistance lm aer heat treatment.…”