Conference Record of the Twenty-Eighth IEEE Photovoltaic Specialists Conference - 2000 (Cat. No.00CH37036) 2000
DOI: 10.1109/pvsc.2000.915845
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Rapid thermal firing of screen printed contacts for large area crystalline silicon solar cells

Abstract: Rapid Thermal Firing (RTF), i.e. firing of screen printed contacts using Rapid Thermal Processing (RTP), is a promising alternative compared to infrared heated conveyor belt furnaces concerning a reduction in process time. In addition, due to flexible process design and in-situ temperature measurement, RTF is well suited for detailed studies and optimisation of the firing process and the contact formation. Exploiting the advantages of RTP such as high heating and cooling rates and short plateau times, we have … Show more

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Cited by 11 publications
(4 citation statements)
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“…Despite the relatively large particle size up to about 7 mm, the inks were successfully printed with the aerosol metal jet system. After conventional contact firing in a rapid thermal firing furnace, 13 the adhesion to the silicon surface was of high quality. Unexpectedly, the thin deposited layer even etched through the SiN X antireflection coating during the firing process, yielding a good electrical contact.…”
Section: Printing Resultsmentioning
confidence: 99%
“…Despite the relatively large particle size up to about 7 mm, the inks were successfully printed with the aerosol metal jet system. After conventional contact firing in a rapid thermal firing furnace, 13 the adhesion to the silicon surface was of high quality. Unexpectedly, the thin deposited layer even etched through the SiN X antireflection coating during the firing process, yielding a good electrical contact.…”
Section: Printing Resultsmentioning
confidence: 99%
“…Variation of the wafer thickness leads to considerable changes of the thermal mass during processing, which results in correspondingly varying peak wafer temperatures often reported for standard firing in infrared-heated conveyor belt furnaces. By means of rapid thermal firing with closed-loop temperature control based on calibrated pyrometry, 13 control of process temperature during contact firing can be significantly improved, and in particular, the firing process becomes independent of the thermal mass of the wafers. Hence, this reduces possible fill factor variations and ensures high-quality contacts, especially for laboratory epitaxial cells with strongly varying substrate thickness.…”
Section: Resultsmentioning
confidence: 99%
“…The solar cell contacts were fired by the rapid thermal firing technique in a single-wafer RTP furnace with a closed-loop temperature control based on calibrated pyrometry. 13 The epitaxial as well as the reference cells were fired by the same thermal firing cycle. Finally, edge isolation was carried out with a Nd:YAG laser.…”
Section: Solar Cell Processmentioning
confidence: 99%
“…It has been shown that firing of screen-printed contacts in an RTP system can result in a contact resistance as low as 10 -cm [7], though the resulting fill factor (FF) was only 0.724 on multicrystalline silicon, presumably due to junction leakage. Recently, the Design of Experiment technique has been implemented to optimize a rapid thermal firing (RTF) process resulting in FF as high as 0.782 on Cz Si and 0.774 on multicrystalline Si [8]. However, the influence of RTF on the bulk defect passivation of mc-Si solar cells, if any, was not identified.…”
mentioning
confidence: 99%