Raster shaped beam pattern generation

Rishton, S. A.; Varner, Jeffrey K.; Veneklasen, Lee H.; Boegli, Volker; Sagle, A.; Hofmann, Ulrich; Kao, H.; Wang, W.

doi:10.1116/1.591098

Cited by 5 publications

(2 citation statements)

References 7 publications

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“…The exposure for mask writing used MEBES Quadra™ RSB (Raster Shaped Beam) 50KeV systems. (6)(7)(8) Post-exposure bake is performed on a SigmaMeltec bake station at 75-90ºC. PEB is necessary to drive the acidcatalyzed reaction creating a differential solubility in the exposed areas.…”

Section: Methodsmentioning

confidence: 99%

Comparative study of two negative CAR resists: EN-024M and NEB 31

et al. 2004

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In this paper, two negative-tone chemically amplified resists (CAR) are evaluated. The methodology and results are compared and discussed. The resists include EN-024M from TOK, and NEB 31 from Sumitomo. Both resists show high contrast, good dry etch selectivity, and high environmental stability. EN-024M showed good coating uniformity while NEB31 showed a coating uniformity problem. This was a round "dimple" approximately one centimeter in diameter of different thickness and density at the center of the plate. We addressed the "dimple" coating problem as described in the paper. Optimum PAB and PEB temperatures and nominal to maximum doses for isolated features were determined by running a matrix of PAB and PEB temperatures along with a dose series. We evaluated the process and compared the lithographic performance in terms of dose sensitivity, dose and bake latitude, resolution, resist profile, OPC (Optical Proximity Correction) pattern fidelity, CD uniformity, environmental stability, Line Edge Roughness (LER) and etching bias and resistance.

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Section: Methodsmentioning

confidence: 99%

Comparative study of two negative CAR resists: EN-024M and NEB 31

et al. 2004

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“…8 This strategy combines beam shaping with the best attributes of a raster-scan system. The use of a very small beam-shaping field allows a relatively high flash rate of 100…”

Section: A Raster Shaped Beam Strategy and Data Pathmentioning

confidence: 99%

Implementation of real-time proximity effect correction in a raster shaped beam tool

Boegli

Johnson

Kao

et al. 2000

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Articles you may be interested inProximity effect correction using pattern shape modification and area density map for electron-beam projection lithography J.Proximity effect correction using pattern shape modification and area density map Accuracy and efficiency in electron beam proximity effect correction Dose, shape, and hybrid modifications for PYRAMID in electron beam proximity effect correction J. Vac. Sci. Technol. B 15, 2303 (1997 10.1116/1.589634 Design and implementation of a real-time hierarchical parallel postprocessor for 100 keV electron beam lithography J.

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High-throughput electron-beam lithography with a raster-scanned, variably shaped beam

Veneklasen

Kao

Rishton

et al. 2001

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Propagation and post-acceleration of a pseudospark-sourced electron beam Distributed, multiple variable shaped electron beam column for high throughput maskless lithography A raster-shaped beam writing strategy has been tested on a prototype 50 keV electron-beam lithography workstation. The test stand was constructed to prove the raster-shaped beam concept by exposing patterns at full throughput over small areas. Patterns are composed in a raster-scanned array of variably shaped flashes at 100 MHz flash rate, with 0.9 A full beam current, and 2200 A/cm 2 current density using a thermal field emission source. Writing speed is independent of resist sensitivity and pattern complexity. By comparison, a typical variably shaped beam system with a LaB 6 source would have a current density of 10-30 A/cm 2 and a flash rate of 2-10 MHz, depending on resist sensitivity and deflection settling time.

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Raster shaped beam pattern generation

Cited by 5 publications

References 7 publications

Comparative study of two negative CAR resists: EN-024M and NEB 31

Comparative study of two negative CAR resists: EN-024M and NEB 31

Implementation of real-time proximity effect correction in a raster shaped beam tool

High-throughput electron-beam lithography with a raster-scanned, variably shaped beam

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