Implementation of real-time proximity effect correction in a raster shaped beam tool

Propagation and post-acceleration of a pseudospark-sourced electron beam Distributed, multiple variable shaped electron beam column for high throughput maskless lithography A raster-shaped beam writing strategy has been tested on a prototype 50 keV electron-beam lithography workstation. The test stand was constructed to prove the raster-shaped beam concept by exposing patterns at full throughput over small areas. Patterns are composed in a raster-scanned array of variably shaped flashes at 100 MHz flash rate, with 0.9 A full beam current, and 2200 A/cm 2 current density using a thermal field emission source. Writing speed is independent of resist sensitivity and pattern complexity. By comparison, a typical variably shaped beam system with a LaB 6 source would have a current density of 10-30 A/cm 2 and a flash rate of 2-10 MHz, depending on resist sensitivity and deflection settling time.

show abstract

Implementation of real-time proximity effect correction in a raster shaped beam tool

Cited by 6 publications

References 8 publications

Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs

Optimization of a Short-Range Proximity Effect Correction Algorithm in E-Beam Lithography Using GPGPUs

Exposure optimization in high-resolution e-beam lithography

High-throughput electron-beam lithography with a raster-scanned, variably shaped beam

Contact Info

Product

Resources

About